Pneumatic bearing with bonded polymer film wear surface and production method thereof

{
  "publication_number": "US10267360B2",
  "country": "US",
  "kind": "B2",
  "title": "Pneumatic bearing with bonded polymer film wear surface and production method thereof",
  "abstract": "Disclosed are pneumatic bearings with a bonded polymer film wear surface and production methods thereof. For example, a pneumatic bearing for supporting a payload is disclosed. The pneumatic bearing has a bearing surface having a polyimide film fastened to a substrate with a bonding layer. The polyimide film can comprise poly-oxydiphenylene-pyromellitimide and the bonding layer can comprise diglycidyl ether of bisphenol A, 1,4-butanediol diglycidyl ether, and 2,2,4-trimetylhexametylen-1,6-diamin.",
  "claims": [
    "1. A pneumatic bearing for use in a reticle handling system of a lithography tool, comprising: a flat pneumatic bearing substrate configured to support a payload; a bonding layer disposed on the pneumatic bearing substrate; and a polymer film disposed on the bonding layer, wherein the pneumatic bearing is further configured to deliver compressed gas to create a consistent gas film upon which the payload rests and/or moves.",
    "2. The pneumatic bearing of claim 1, wherein the flat pneumatic bearing substrate is made from a material selected from the group consisting of metals, glass, and ceramics.",
    "3. The pneumatic bearing of claim 1, wherein the bonding layer comprises diglycidyl ether of bisphenol A; 1,4-butanediol diglycidyl ether; and 2,2,4-trimetylhexametylen-1,6-diamin.",
    "4. The pneumatic bearing of claim 1, wherein the polymer film comprises poly-oxydiphenylene-pyromellitimide.",
    "5. The pneumatic bearing of claim 1, wherein the polymer film is at least 25 microns thick.",
    "6. The pneumatic bearing of claim 1, wherein the polymer film is between seven to one hundred microns thick."
  ],
  "description_excerpt": "Field of the Invention\n\nThe present invention generally relates to lithography, and more particularly to a pneumatic bearing.\n\nBackground Art\n\nLithography is widely recognized as a key process in manufacturing integrated circuits (ICs), as well as other devices and structures. A lithographic apparatus is a machine, used during lithography, which applies a pattern onto a substrate, such as onto a target portion of the substrate. During manufacture of ICs with a lithographic apparatus, a patterning device (which is alternatively referred to as a mask or a reticle) generates a circuit pattern to be formed on an individual layer in an IC. This pattern can be transferred onto the target portion (e.g., comprising part of, one or several dies) on the substrate (e.g., a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (e.g., resist) provided on the substrate. In general, a single substrate contains a network of adjacent target portions that are successively patterned. Manufacturing different layers of the IC often requires imaging different patterns on different layers with different reticles. Therefore, reticles and substrates must be changed during the lithographic process. To facilitate reticle handling, stages that support reticles are provided with pneumatic bearings.\n\nA bearing is a device that reduces friction between moving parts, and/or supports moving loads. There are two main types of bearings. An anti-friction bearing minimizes friction using devices such as roller bearings or ball bearings.",
  "cpc": [
    "F16C 33/02",
    "B32B 15/08",
    "B32B 15/18",
    "B32B 2307/536",
    "B32B 2307/558",
    "B32B 2307/732",
    "B32B 2457/08",
    "B32B 27/08",
    "B32B 27/28",
    "B32B 27/281",
    "B32B 27/38",
    "B32B 9/005",
    "B32B 9/045",
    "F16C 32/06",
    "F16C 33/20",
    "F16C 33/201",
    "F16C 43/02",
    "Y10T 156/1052"
  ],
  "ipc": [
    "F16C 33/02",
    "F16C 43/02",
    "B32B 15/08",
    "B32B 15/18",
    "B32B 27/08",
    "B32B 27/28",
    "B32B 27/38",
    "B32B 9/00",
    "B32B 9/04",
    "F16C 33/20"
  ],
  "assignees": [
    "ASML Holding NV"
  ],
  "inventors": [
    "Dragos Pariza",
    "Santiago E. del Puerto"
  ],
  "filing_date": "2011-04-06",
  "publication_date": "2019-04-23",
  "grant_date": "2019-04-23",
  "priority_date": "2010-06-23",
  "application_number": "US-201113700369-A",
  "family_id": "44356237",
  "cited_by_count": 1,
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}