Patent · US6576138B2 · B2 · US
Method for purifying semiconductor gases
- (11) Publication number
- US6576138B2
- (21) Application number
- US-73580200-A
- (22) Filing date
- 2000-12-14
- (30) Priority date
- 2000-12-14
- (43) Publication date
- 2003-06-10
- (45) Date of grant
- 2003-06-10
- (52) CPC
- C01C Ammonia; cyanogen; compounds thereof: 1/024
- C01B Non-metallic elements; compounds thereof; {metalloids or compounds thereof not covered by subclass C01C}: 21/045, 2210/0031, 2210/0034, 2210/0042, 23/0052
- H10P Generic processes or apparatus for the manufacture or treatment of devices covered by class H10: 95/00
- Y02P Climate change mitigation technologies in the production or processing of goods: 20/52
- (73) Assignee
- PRAXAIR TECHNOLOGY INC
- (54) Title
- Method for purifying semiconductor gases
- (57) Abstract
This invention is directed a method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a) passing the impure liquefied gas through a first adsorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b) passing the first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c) passing the second purified gas through a second adsorption means to remove impurities from the vapor phase therein to produce the ultra-high purity gas.
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Claims (18)
- A method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a. passing an impure liquefied gas through a first adsorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b. passing said first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c. passing said second purified gas through a second adsorption means to remove impurities from the vapor phase therein to produce said ultra-high purity gas.
- The method of claim 1 wherein said first adsorption means comprises first molecular sieves.
- The method of claim 2 wherein said first molecular sieves are selected from the group consisting of 5A, 4A, 3A, 13X, AW 500 molecular sieves and activated charcoal.
- The method of claim 1 wherein passing said first purified fluid through said evaporation means comprises distillation of said first purified fluid at said evaporation means.
- The method of claim 4 wherein passing said first purified fluid through said evaporation means comprises distillation and reboiling of said first purified fluid at said evaporation means.
- The method of claim 4 wherein passing said first purified fluid through said evaporation means comprises a single step distillation of said first purified fluid at said evaporation means.
- The method of claim 1 wherein passing said first purified fluid through said evaporation means comprises a vapor phase transfill of said first purified fluid at said evaporation means.
- The method of claim 7 wherein said second adsorption means comprises second molecular sieves.
- The method of claim 1 wherein said second molecular sieves are selected from the group consisting of 5A, 4A, 3A, 13X, AW 500 molecular sieves and activated charcoal.
- The method of claim 1 wherein said ultra-high purity gas is selected from the group consisting of ammonia, nitrogen, helium, and argon.
- The method of claim 1 wherein said impurities comprise water.
- A method for purifying impure ammonia to produce ultra-high purity ammonia comprising the steps of a. passing impure liquefied ammonia through a molecular sieve to remove impurities from the liquid phase therein to produce a first purified ammonia fluid b. passing said first purified ammonia fluid to an evaporation means to remove impurities therein to produce a second purified ammonia gas; and c. passing said second purified ammonia gas through another molecular sieve to remove impurities from the vapor phase therein to produce ultra-high purity ammonia.
- The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises distillation of said first purified ammonia fluid at said evaporation means.
- The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises distillation and reboiling of said first purified ammonia fluid at said evaporation means.
- The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises a single step distillation of said first purified ammonia fluid at said evaporation means.
- The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises a vapor phase transfill of said first purified ammonia fluid at said evaporation means.
- The method of claim 12 wherein said first and second molecular sieves are selected from the group consisting of 5A, 4A, 3A, 13 X, AW 500 molecular sieves and activated charcoal.
- The method of claim 12 wherein said impurities comprise water.
Citations (3)
- EP0484301A1
- US5385689A
- US5846386A
Record as JSON
{
"publication_number": "US6576138B2",
"country": "US",
"kind": "B2",
"title": "Method for purifying semiconductor gases",
"abstract": "This invention is directed a method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a) passing the impure liquefied gas through a first adsorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b) passing the first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c) passing the second purified gas through a second adsorption means to remove impurities from the vapor phase therein to produce the ultra-high purity gas.",
"claims": [
"1. A method for purifying an impure gas to produce an ultra-high purity gas comprising the steps of a. passing an impure liquefied gas through a first adsorption means to remove impurities from the liquid phase therein to produce a first purified fluid; b. passing said first purified fluid through an evaporation means to remove impurities therein to produce a second purified gas; and c. passing said second purified gas through a second adsorption means to remove impurities from the vapor phase therein to produce said ultra-high purity gas.",
"2. The method of claim 1 wherein said first adsorption means comprises first molecular sieves.",
"3. The method of claim 2 wherein said first molecular sieves are selected from the group consisting of 5A, 4A, 3A, 13X, AW 500 molecular sieves and activated charcoal.",
"4. The method of claim 1 wherein passing said first purified fluid through said evaporation means comprises distillation of said first purified fluid at said evaporation means.",
"5. The method of claim 4 wherein passing said first purified fluid through said evaporation means comprises distillation and reboiling of said first purified fluid at said evaporation means.",
"6. The method of claim 4 wherein passing said first purified fluid through said evaporation means comprises a single step distillation of said first purified fluid at said evaporation means.",
"7. The method of claim 1 wherein passing said first purified fluid through said evaporation means comprises a vapor phase transfill of said first purified fluid at said evaporation means.",
"8. The method of claim 7 wherein said second adsorption means comprises second molecular sieves.",
"9. The method of claim 1 wherein said second molecular sieves are selected from the group consisting of 5A, 4A, 3A, 13X, AW 500 molecular sieves and activated charcoal.",
"10. The method of claim 1 wherein said ultra-high purity gas is selected from the group consisting of ammonia, nitrogen, helium, and argon.",
"11. The method of claim 1 wherein said impurities comprise water.",
"12. A method for purifying impure ammonia to produce ultra-high purity ammonia comprising the steps of a. passing impure liquefied ammonia through a molecular sieve to remove impurities from the liquid phase therein to produce a first purified ammonia fluid b. passing said first purified ammonia fluid to an evaporation means to remove impurities therein to produce a second purified ammonia gas; and c. passing said second purified ammonia gas through another molecular sieve to remove impurities from the vapor phase therein to produce ultra-high purity ammonia.",
"13. The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises distillation of said first purified ammonia fluid at said evaporation means.",
"14. The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises distillation and reboiling of said first purified ammonia fluid at said evaporation means.",
"15. The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises a single step distillation of said first purified ammonia fluid at said evaporation means.",
"16. The method of claim 12 wherein passing said first purified ammonia fluid to said evaporation means comprises a vapor phase transfill of said first purified ammonia fluid at said evaporation means.",
"17. The method of claim 12 wherein said first and second molecular sieves are selected from the group consisting of 5A, 4A, 3A, 13 X, AW 500 molecular sieves and activated charcoal.",
"18. The method of claim 12 wherein said impurities comprise water."
],
"cpc": [
"C01C 1/024",
"C01B 21/045",
"C01B 2210/0031",
"C01B 2210/0034",
"C01B 2210/0042",
"C01B 23/0052",
"H10P 95/00",
"Y02P 20/52"
],
"assignees": [
"PRAXAIR TECHNOLOGY INC"
],
"filing_date": "2000-12-14",
"publication_date": "2003-06-10",
"grant_date": "2003-06-10",
"priority_date": "2000-12-14",
"application_number": "US-73580200-A",
"family_id": "24957243",
"citations": [
"EP0484301A1",
"US5385689A",
"US5846386A"
]
}
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