Patent · US4610771A · A · US
Sputtered films of metal alloy oxides and method of preparation thereof
- (11) Publication number
- US4610771A
- (21) Application number
- US-66568084-A
- (22) Filing date
- 1984-10-29
- (30) Priority date
- 1984-10-29
- (43) Publication date
- 1986-09-09
- (45) Date of grant
- 1986-09-09
- (52) CPC
- C03C Chemical composition of glasses, glazes or vitreous enamels; surface treatment of glass; surface treatment of fibres or filaments made from glass, minerals or slags; joining glass to glass or other materials: 17/3613, 17/36, 17/3618, 17/3644, 17/3652, 17/366, 17/3681, 2217/78
- C23C Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general: 14/08, 14/18
- G02B Optical elements, systems or apparatus: 1/116, 5/208
- (73) Assignee
- PPG INDUSTRIES INC
- (54) Title
- Sputtered films of metal alloy oxides and method of preparation thereof
- (57) Abstract
A metal alloy oxide film and sputtering method for its production are disclosed, as well as a high transmittance, low emissivity coated product employing said metal alloy oxide film as an antireflective film in combination with a metallic film such as silver.
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Claims (20)
- A high transmittance, low emissivity article comprising: a. a transparent nonmetallic substrate; b. a first transparent film comprising an oxide reaction product of a metal alloy comprising zinc and tin deposited on a surface of said substrate; c. a transparent metallic film deposited on said first metal alloy oxide film; and d. a second transparent film comprising an oxide reaction product of a metal alloy comprising zinc and tin deposited on said metallic film.
- An article according to claim 1, wherein the substrate is glass.
- An article according to claim 2, wherein the metallic film is silver.
- An article according to claim 3, wherein the metal alloy consists essentially of zinc and tin.
- An article according to claim 4, wherein the metal alloy comprises from about 10 to about 90 percent zinc.
- An article according to claim 5, wherein the metal alloy comprises about 30 to 60 percent zinc.
- An article according to claim 6, wherein the metal alloy comprises about 50 to 54 percent zinc.
- An article according to claim 4, wherein the transparent film comprising an oxide reaction product of a metal alloy comprises zinc stannate.
- An article according to claim 1, wherein a transparent metal-contining film is deposited between the transparent metallic film and the second trnsparent film comprising an oxide reaction product of a metal alloy.
- An article according to claim 9, wherein the transparent metal-containing film comprises a metal alloy of zinc and tin.
- A method for depositing a film comprising an oxide of a metal alloy comprising the steps of: a. forming a cathode target comprising a metal alloy of zinc and tin; b. placing a substrate to be coated in an evacuated chamber with said cathode target; and c. sputtering said metal alloy cathode target in a reactive atmosphere comprising oxygen thereby depositing a metal alloy oxide film on a surface of said substrate.
- A method according to claim 11, wherein said sputtering is magnetically enhanced.
- A method according to claim 12, wherein said substrate is glass.
- A method according to claim 13, wherein said metal alloy consists essentially of zinc and tin.
- A method according to claim 14, wherein said film comprises zinc stannate.
- A method for making a multiple layer high transmittance, low emissivity coated product comprising the steps of: a. placing a transparent, nonmetallic substrate in a sputtering chamber; b. sputtering a cathode target comprising an alloy of zinc and tin in a reactive atmosphere comprising oxygen to deposit a transparent metal alloy oxide film on a surface of said substrate; c. sputtering a silver cathode target, in an inert atmosphere to deposit a transparent silver film on said metal alloy oxide film; and d. sputtering a cathode target comprising an alloy of zinc and tin in a reactive atmosphere comprising oxygen to deposit a metal alloy oxide film on said silver film.
- The method according to claim 16, wherein the substrate is glass.
- The method according to claim 17, wherein said metal alloy consists essentially of zinc and tin.
- The method according to claim 18, wherein said metal alloy oxide film comprises zinc stannate.
- The method according to claim 16, which further comprises the step of depositing a transparent metal alloy film between said silver film and said metal alloy oxide film.
Citations (13)
- DE2750500A1
- GB2097428A
- US27473A
- US3530055A
- US4094763A
- US4113599A
- US4166018A
- US4201649A
- US4327967A
- US4349425A
- US4462883A
- US4548691A
- USRE27473E
Record as JSON
{
"publication_number": "US4610771A",
"country": "US",
"kind": "A",
"title": "Sputtered films of metal alloy oxides and method of preparation thereof",
"abstract": "A metal alloy oxide film and sputtering method for its production are disclosed, as well as a high transmittance, low emissivity coated product employing said metal alloy oxide film as an antireflective film in combination with a metallic film such as silver.",
"claims": [
"1. A high transmittance, low emissivity article comprising: a. a transparent nonmetallic substrate; b. a first transparent film comprising an oxide reaction product of a metal alloy comprising zinc and tin deposited on a surface of said substrate; c. a transparent metallic film deposited on said first metal alloy oxide film; and d. a second transparent film comprising an oxide reaction product of a metal alloy comprising zinc and tin deposited on said metallic film.",
"2. An article according to claim 1, wherein the substrate is glass.",
"3. An article according to claim 2, wherein the metallic film is silver.",
"4. An article according to claim 3, wherein the metal alloy consists essentially of zinc and tin.",
"5. An article according to claim 4, wherein the metal alloy comprises from about 10 to about 90 percent zinc.",
"6. An article according to claim 5, wherein the metal alloy comprises about 30 to 60 percent zinc.",
"7. An article according to claim 6, wherein the metal alloy comprises about 50 to 54 percent zinc.",
"8. An article according to claim 4, wherein the transparent film comprising an oxide reaction product of a metal alloy comprises zinc stannate.",
"9. An article according to claim 1, wherein a transparent metal-contining film is deposited between the transparent metallic film and the second trnsparent film comprising an oxide reaction product of a metal alloy.",
"10. An article according to claim 9, wherein the transparent metal-containing film comprises a metal alloy of zinc and tin.",
"11. A method for depositing a film comprising an oxide of a metal alloy comprising the steps of: a. forming a cathode target comprising a metal alloy of zinc and tin; b. placing a substrate to be coated in an evacuated chamber with said cathode target; and c. sputtering said metal alloy cathode target in a reactive atmosphere comprising oxygen thereby depositing a metal alloy oxide film on a surface of said substrate.",
"12. A method according to claim 11, wherein said sputtering is magnetically enhanced.",
"13. A method according to claim 12, wherein said substrate is glass.",
"14. A method according to claim 13, wherein said metal alloy consists essentially of zinc and tin.",
"15. A method according to claim 14, wherein said film comprises zinc stannate.",
"16. A method for making a multiple layer high transmittance, low emissivity coated product comprising the steps of: a. placing a transparent, nonmetallic substrate in a sputtering chamber; b. sputtering a cathode target comprising an alloy of zinc and tin in a reactive atmosphere comprising oxygen to deposit a transparent metal alloy oxide film on a surface of said substrate; c. sputtering a silver cathode target, in an inert atmosphere to deposit a transparent silver film on said metal alloy oxide film; and d. sputtering a cathode target comprising an alloy of zinc and tin in a reactive atmosphere comprising oxygen to deposit a metal alloy oxide film on said silver film.",
"17. The method according to claim 16, wherein the substrate is glass.",
"18. The method according to claim 17, wherein said metal alloy consists essentially of zinc and tin.",
"19. The method according to claim 18, wherein said metal alloy oxide film comprises zinc stannate.",
"20. The method according to claim 16, which further comprises the step of depositing a transparent metal alloy film between said silver film and said metal alloy oxide film."
],
"cpc": [
"C03C 17/3613",
"C03C 17/36",
"C03C 17/3618",
"C03C 17/3644",
"C03C 17/3652",
"C03C 17/366",
"C03C 17/3681",
"C03C 2217/78",
"C23C 14/08",
"C23C 14/18",
"G02B 1/116",
"G02B 5/208"
],
"assignees": [
"PPG INDUSTRIES INC"
],
"filing_date": "1984-10-29",
"publication_date": "1986-09-09",
"grant_date": "1986-09-09",
"priority_date": "1984-10-29",
"application_number": "US-66568084-A",
"family_id": "24671121",
"citations": [
"DE2750500A1",
"GB2097428A",
"US27473A",
"US3530055A",
"US4094763A",
"US4113599A",
"US4166018A",
"US4201649A",
"US4327967A",
"US4349425A",
"US4462883A",
"US4548691A",
"USRE27473E"
]
}
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