Patents full text · MLC-0201
CPC subclass C23C
Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general
| No. | Publication | Title | Published | Assignee |
|---|---|---|---|---|
| 1 | US12004337B2 | Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools | 2024-06-04 | APPLIED MATERIALS INC |
| 2 | US2024057464A1 | Manufacturing equipment for light-emitting device | 2024-02-15 | SEMICONDUCTOR ENERGY LAB |
| 3 | US2022056599A1 | Vertical Branched Graphene | 2022-02-24 | COMMW SCIENT IND RES ORG |
| 4 | US11248289B2 | Multilayered corrosion and anti-galling coating for threads and wearable materials | 2022-02-15 | Dallas Thin Films |
| 5 | US10930494B2 | Vapor phase transport system and method for depositing perovskite semiconductors | 2021-02-23 | SWIFT SOLAR INC |
| 6 | US2020248296A1 | Method of surface treatment for gear for strain wave reduction gear mechanism | 2020-08-06 | FUJI KIHAN CO LTD |
| 7 | US10685832B1 | Substrate processing apparatus | 2020-06-16 | KOKUSAI ELECTRIC CORP |
| 8 | US10403531B2 | Semiconductor manufacturing apparatus with supporting columns and tables | 2019-09-03 | TOSHIBA MEMORY CORP |
| 9 | US10367080B2 | Method of forming a germanium oxynitride film | 2019-07-30 | ASM IP HOLDING BV |
| 10 | US10332747B1 | Selective titanium nitride deposition using oxides of lanthanum masks | 2019-06-25 | GLOBALFOUNDRIES INC |
| 11 | US10276355B2 | Multi-zone reactor, system including the reactor, and method of using the same | 2019-04-30 | ASM IP HOLDING BV |
| 12 | US10272468B2 | Integrated fluidjet system for stripping, prepping and coating a part | 2019-04-30 | VLN ADVANCED TECH INC |
| 13 | US10192734B2 | Short inorganic trisilylamine-based polysilazanes for thin film deposition | 2019-01-29 | AIR LIQUIDE ADVANCED MAT INC |
| 14 | US10106886B2 | Coating apparatus for resin container, and resin container manufacturing system | 2018-10-23 | NISSEI ASB MACHINE CO LTD |
| 15 | US9644266B2 | Film forming apparatus, gas supply device and film forming method | 2017-05-09 | TOKYO ELECTRON LTD |
| 16 | US9525262B2 | Slab laser and amplifier and method of use | 2016-12-20 | STUART MARTIN A |
| 17 | US9476116B2 | Process for treating a plastic component part | 2016-10-25 | OERLIKON SURFACE SOLUTIONS AG TRUBBACH |
| 18 | US2016163561A1 | Technique to deposit sidewall passivation for high aspect ratio cylinder etch | 2016-06-09 | LAM RES CORP |
| 19 | US9051650B2 | In-line metallizer assemblies and part-coating conveyor systems incorporating the same | 2015-06-09 | MARCA MACHINERY LLC |
| 20 | US8771807B2 | Organoaminosilane precursors and methods for making and using same | 2014-07-08 | XIAO MANCHAO |
| 21 | US8748780B2 | Substrate processing apparatus, substrate processing method, and computer-readable storage medium | 2014-06-10 | MORO SHOUKEN |
| 22 | US2014130687A1 | Primer composition, structure including primer layer composed of the composition, and method of producing the structure | 2014-05-15 | SHIBUSAWA KUNIHIKO |
| 23 | US2014099451A1 | Method for depositing layers on a glass substrate by means of low-pressure pecvd | 2014-04-10 | MAHIEU STIJN |
| 24 | US8579566B2 | Blind fastener and production method thereof | 2013-11-12 | MAKINO TAKANORI |
| 25 | US2013078392A1 | Halogenated organoaminosilane precursors and methods for depositing films comprising same | 2013-03-28 | XIAO MANCHAO |
| 26 | US2012088615A1 | CVT Pulley With Engineered Surface | 2012-04-12 | BRIGGS ROGER L |
| 27 | US2012027916A1 | Arrangement and method for measurement of the temperature and of the thickness growth of silicon rods in a silicon deposition reactor | 2012-02-02 | WILFRIED VOLLMAR |
| 28 | US2011263115A1 | Nmos metal gate materials, manufacturing methods, and equipment using cvd and ald processes with metal based precursors | 2011-10-27 | APPLIED MATERIALS INC |
| 29 | US7795160B2 | ALD of metal silicate films | 2010-09-14 | ASM INC |
| 30 | US2010170441A1 | Method of Forming Metal Oxide and Apparatus for Performing the Same | 2010-07-08 | WON SEOK-JUN |
| 31 | US7122222B2 | Precursors for depositing silicon containing films and processes thereof | 2006-10-17 | AIR PROD & CHEM |
| 32 | US6776848B2 | Motorized chamber lid | 2004-08-17 | APPLIED MATERIALS INC |
| 33 | US6740424B2 | Surface coated aluminum fine powder and aqueous chromium-free corrosion inhibiting coating composition including the same | 2004-05-25 | |
| 34 | US6720087B2 | Temperature stable protective coating over a metallic substrate surface | 2004-04-13 | ALSTOM TECHNOLOGY LTD |
| 35 | US6660662B2 | Method of reducing plasma charge damage for plasma processes | 2003-12-09 | APPLIED MATERIALS INC |
| 36 | US6534395B2 | Method of forming graded thin films using alternating pulses of vapor phase reactants | 2003-03-18 | ASM MICROCHEMISTRY OY |
| 37 | US6517692B1 | Apparatus for flow-line treatment of articles in an artificial medium | 2003-02-11 | VACUMETAL B V |
| 38 | US6498107B1 | Interface control for film deposition by gas-cluster ion-beam processing | 2002-12-24 | EPION CORP |
| 39 | US6461731B1 | Solar management coating system including protective DLC | 2002-10-08 | GUARDIAN INDUSTRIES |
| 40 | US6440282B1 | Sputtering reactor and method of using an unbalanced magnetron | 2002-08-27 | APPLIED MATERIALS INC |
| 41 | US6436251B2 | Vault-shaped target and magnetron having both distributed and localized magnets | 2002-08-20 | APPLIED MATERIALS INC |
| 42 | US6412437B1 | Plasma enhanced chemical vapor deposition reactor and plasma enhanced chemical vapor deposition process | 2002-07-02 | MICRON TECHNOLOGY INC |
| 43 | US6410463B1 | Method for forming film with low dielectric constant on semiconductor substrate | 2002-06-25 | ASM JAPAN |
| 44 | US6397776B1 | Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators | 2002-06-04 | GEN ELECTRIC |
| 45 | US6338872B1 | Film forming method | 2002-01-15 | CANON KK |
| 46 | US6325138B1 | Article exhibiting improved resistance to galvanic corrosion | 2001-12-04 | CARRIER CORP |
| 47 | US6274496B1 | Method for single chamber processing of PECVD-Ti and CVD-TiN films for integrated contact/barrier applications in IC manufacturing | 2001-08-14 | TOKYO ELECTRON LTD |
| 48 | US6183563B1 | Apparatus for depositing thin films on semiconductor wafers | 2001-02-06 | IPS LTD |
| 49 | US6123775A | Reaction chamber component having improved temperature uniformity | 2000-09-26 | LAM RES CORP |
| 50 | US6080334A | Corrosion resistant buffer system for metal products | 2000-06-27 | ELISHA TECHNOLOGIES CO LLC |
| 51 | US6030881A | High throughput chemical vapor deposition process capable of filling high aspect ratio structures | 2000-02-29 | NOVELLUS SYSTEMS INC |
| 52 | US5851675A | Apparatus having sliding member with precursor material providing solid lubricant material during sliding | 1998-12-22 | HITACHI LTD |
| 53 | US5826818A | Compact strip processing facility | 1998-10-27 | KVAERNER U S INC |
| 54 | US5798139A | Apparatus for and method of manufacturing plastic container coated with carbon film | 1998-08-25 | KIRIN BREWERY |
| 55 | US5679412A | Method and apparatus for producing gas impermeable, chemically inert container structures for food and volatile substances | 1997-10-21 | KUEHNLE MANFRED R |
| 56 | US5665167A | Plasma treatment apparatus having a workpiece-side electrode grounding circuit | 1997-09-09 | TOKYO ELECTRON LTD |
| 57 | US5648123A | Process for producing a strong bond between copper layers and ceramic | 1997-07-15 | HOECHST AG |
| 58 | US5476552A | Surface preparation for bonding titanium | 1995-12-19 | US ARMY |
| 59 | US5422139A | Method for a reactive surface treatment of a workpiece and a treatment chamber for practicing such method | 1995-06-06 | BALZERS HOCHVAKUUM |
| 60 | US5156727A | Film thickness uniformity control apparatus for in-line sputtering systems | 1992-10-20 | VIRATEC THIN FILMS INC |
| 61 | US4971676A | Support device for a thin substrate of a semiconductor material | 1990-11-20 | CENTRE NAT ETD TELECOMM |
| 62 | US4610771A | Sputtered films of metal alloy oxides and method of preparation thereof | 1986-09-09 | PPG INDUSTRIES INC |
| 63 | US4364803A | Deposition of catalytic electrodes on ion-exchange membranes | 1982-12-21 | ORONZIO DE NORA IMPIANTI |
63 records in this listing. Patents full text (MLC-0201). Request the full dataset.