Patent · US9589770B2 · B2 · US
Method and systems for in-situ formation of intermediate reactive species
- (11) Publication number
- US9589770B2
- (21) Application number
- 13/791,246
- (22) Filing date
- 2013-03-08
- (30) Priority date
- 2013-03-08
- (43) Publication date
- 2017-03-07
- (45) Date of grant
- 2017-03-07
- (51) IPC
- H01J 37/32; C23C 16/00; C23C 16/452; C23C 16/455; C23C 16/52; C23F 1/00; H01L 21/306
- (52) CPC
- H01J Electric discharge tubes or discharge lamps: 37/32422, 2237/3321, 2237/334, 2237/335, 37/32357, 37/32449, 37/32862
- B08B Cleaning in general; prevention of fouling in general: 7/0035
- C23C Coating metallic material; coating material with metallic material; surface treatment of metallic material by diffusion into the surface, by chemical conversion or substitution; coating by vacuum evaporation, by sputtering, by ion implantation or by chemical vapour deposition, in general: 16/452, 16/45557, 16/50, 16/52
- (73) Assignee
- ASM IP Holding BV
- (72) Inventors
- Jereld Lee Winkler
- (54) Title
- Method and systems for in-situ formation of intermediate reactive species
- (57) Abstract
A system and method for providing intermediate reactive species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as intermediate reactive species from the remote plasma unit are provided to the reaction chamber.
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Claims (20)
- A remote plasma system comprising: a reactor comprising a reaction chamber; a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source; a first gas source fluidly coupled to the remote plasma unit, wherein the first gas source comprises a precursor for intermediate reactive species; a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device and wherein the pressure control device is a closed-loop pressure control device; a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit; and a controller coupled to the pressure control device and to the control valve and configured to control the pressure control device and the control valve to maintain steady-state operation of the remote plasma unit when the intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source.
- The remote plasma system of claim 1, further comprising a flow control unit coupled to the first gas source.
- The remote plasma system of claim 1, wherein the reactor is selected from the group consisting of a plasma-enhance chemical vapor deposition reactor, a plasma-enhanced atomic layer deposition reactor, a plasma-enhanced etch reactor, a plasma-enhanced clean reactor, and a plasma-enhanced treatment reactor.
- The remote plasma system of claim 1, wherein the control valve is a fast-response pneumatic valve.
- The remote plasma system of claim 1, further comprising an integrated inlet manifold block.
- The remote plasma system of claim 1, further comprising a catalyst between the remote plasma unit and the reaction chamber.
- The remote plasma system of claim 6, wherein the catalyst is between the remote plasma unit and the control valve.
- The remote plasma system of claim 6, wherein the catalyst comprises a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.
- The remote plasma system of claim 1, further comprising a conductance match region between the remote plasma unit and the pressure control device.
- The remote plasma system of claim 1, wherein the remote plasma unit is an inductively coupled plasma unit.
- The remote plasma system of claim 1, wherein the remote plasma unit is a microwave plasma unit.
- The remote plasma system of claim 1, wherein the first gas source comprises one or more of ammonia (NH3), water vapor (H2O), hydrogen peroxide (H202), MMH (mono methyl hydrazine), UDMH (unsymmetrically dimethyl hydrazine), 02/H2, N2/H2, and H2S.
- A plasma-enhanced chemical vapor deposition system comprising: a deposition reactor comprising a reaction chamber; a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source; a first reactant source coupled to the remote plasma unit, wherein the first reactant source is a precursor for intermediate reactive species; a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device, and wherein the pressure control device is a closed-loop pressure control device; a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit; and a controller coupled to the pressure control device and to the control valve to control the pressure control device and the control valve, the controller configured to maintain steady-state operation of the remote plasma unit when intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source.
- The plasma-enhanced chemical vapor deposition system of claim 13, further comprising a catalyst between the remote plasma unit and the control valve.
- The plasma-enhanced chemical vapor deposition system of claim 14, wherein the catalyst comprises a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.
- The plasma-enhanced chemical vapor deposition system of claim 13, further comprising a conductance match region between the remote plasma unit and the vacuum source.
- The plasma-enhanced chemical vapor deposition system of claim 16, wherein the conductance match region is between the remote plasma unit and the pressure control device.
- The plasma-enhanced chemical vapor deposition system of claim 13, wherein the first reactant source comprises one or more of ammonia (NH3), water vapor (H2O), hydrogen peroxide (H202), MMH (mono methyl hydrazine), UDMH (unsymmetrically dimethyl hydrazine), 02/H2, N2/H2, and H2S.
- A remote plasma system comprising: a reactor comprising a reaction chamber; a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source; a first gas source fluidly coupled to the remote plasma unit, wherein the first gas source comprises a precursor for intermediate reactive species; a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device and wherein the pressure control device is a closed-loop pressure control device; a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit; a controller coupled to the pressure control device and to the control valve and configured to control the pressure control device and the control valve to maintain steady-state operation of the remote plasma unit when the intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source; and a catalyst between the remote plasma unit and the control valve, the catalyst comprising a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.
- The remote plasma system of claim 19, further comprising a conductance match region between the remote plasma unit and the vacuum source.
Description
The disclosure generally relates to vapor-phase methods and systems. More particularly, exemplary embodiments of the present disclosure relate to systems and methods for forming intermediate reactive species useful in vapor-phase processes.
Vapor-phase processes are used for a variety of applications. For example, vapor-phase processes are used for chemical vapor deposition to deposit material onto a substrate, vapor-phase etching to remove material from a substrate or a reactor, and vapor-phase treatment processes to treat a surface of a substrate or a reactor.
Precursors or reactants for vapor-phase processes are generally selected according to a material to be deposited, etched, or treated; i.e., the precursors are generally selected to provide desired vapor-phase reactants. However, other factors are often used to select between more than one precursor that might be suitable for a particular application. For example, a reactivity or selectivity of a precursor may be a factor in the selection of the precursor. Another consideration for selecting a precursor is the stability of the precursor - e.g., does the precursor break down into other compounds before the precursor has a chance to take part in a desired reaction. Yet further considerations may include toxicity of a precursor, availability of the precursor, and cost of the precursor. Thus, a precursor that might have better properties, such as higher selectivity, reactivity, and/or provide more uniform deposition, etch, or treatment, may not be selected for a particular application, because the precursor is relatively expensive and/or toxic.
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Record as JSON
{
"publication_number": "US9589770B2",
"country": "US",
"kind": "B2",
"title": "Method and systems for in-situ formation of intermediate reactive species",
"abstract": "A system and method for providing intermediate reactive species from a remote plasma unit to a reaction chamber are disclosed. The system includes a pressure control device to control a pressure at the remote plasma unit as intermediate reactive species from the remote plasma unit are provided to the reaction chamber.",
"claims": [
"1. A remote plasma system comprising: a reactor comprising a reaction chamber; a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source; a first gas source fluidly coupled to the remote plasma unit, wherein the first gas source comprises a precursor for intermediate reactive species; a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device and wherein the pressure control device is a closed-loop pressure control device; a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit; and a controller coupled to the pressure control device and to the control valve and configured to control the pressure control device and the control valve to maintain steady-state operation of the remote plasma unit when the intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source.",
"2. The remote plasma system of claim 1, further comprising a flow control unit coupled to the first gas source.",
"3. The remote plasma system of claim 1, wherein the reactor is selected from the group consisting of a plasma-enhance chemical vapor deposition reactor, a plasma-enhanced atomic layer deposition reactor, a plasma-enhanced etch reactor, a plasma-enhanced clean reactor, and a plasma-enhanced treatment reactor.",
"4. The remote plasma system of claim 1, wherein the control valve is a fast-response pneumatic valve.",
"5. The remote plasma system of claim 1, further comprising an integrated inlet manifold block.",
"6. The remote plasma system of claim 1, further comprising a catalyst between the remote plasma unit and the reaction chamber.",
"7. The remote plasma system of claim 6, wherein the catalyst is between the remote plasma unit and the control valve.",
"8. The remote plasma system of claim 6, wherein the catalyst comprises a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.",
"9. The remote plasma system of claim 1, further comprising a conductance match region between the remote plasma unit and the pressure control device.",
"10. The remote plasma system of claim 1, wherein the remote plasma unit is an inductively coupled plasma unit.",
"11. The remote plasma system of claim 1, wherein the remote plasma unit is a microwave plasma unit.",
"12. The remote plasma system of claim 1, wherein the first gas source comprises one or more of ammonia (NH3), water vapor (H2O), hydrogen peroxide (H202), MMH (mono methyl hydrazine), UDMH (unsymmetrically dimethyl hydrazine), 02/H2, N2/H2, and H2S.",
"13. A plasma-enhanced chemical vapor deposition system comprising: a deposition reactor comprising a reaction chamber; a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source; a first reactant source coupled to the remote plasma unit, wherein the first reactant source is a precursor for intermediate reactive species; a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device, and wherein the pressure control device is a closed-loop pressure control device; a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit; and a controller coupled to the pressure control device and to the control valve to control the pressure control device and the control valve, the controller configured to maintain steady-state operation of the remote plasma unit when intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source.",
"14. The plasma-enhanced chemical vapor deposition system of claim 13, further comprising a catalyst between the remote plasma unit and the control valve.",
"15. The plasma-enhanced chemical vapor deposition system of claim 14, wherein the catalyst comprises a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.",
"16. The plasma-enhanced chemical vapor deposition system of claim 13, further comprising a conductance match region between the remote plasma unit and the vacuum source.",
"17. The plasma-enhanced chemical vapor deposition system of claim 16, wherein the conductance match region is between the remote plasma unit and the pressure control device.",
"18. The plasma-enhanced chemical vapor deposition system of claim 13, wherein the first reactant source comprises one or more of ammonia (NH3), water vapor (H2O), hydrogen peroxide (H202), MMH (mono methyl hydrazine), UDMH (unsymmetrically dimethyl hydrazine), 02/H2, N2/H2, and H2S.",
"19. A remote plasma system comprising: a reactor comprising a reaction chamber; a remote plasma unit fluidly coupled to the reaction chamber and to a vacuum source; a first gas source fluidly coupled to the remote plasma unit, wherein the first gas source comprises a precursor for intermediate reactive species; a pressure control device in fluid communication with and interposed between the remote plasma unit and the vacuum source, wherein the pressure control device controls a pressure upstream of the pressure control device and wherein the pressure control device is a closed-loop pressure control device; a control valve, between the remote plasma unit and the reaction chamber, to pulse the intermediate reactive species from the remote plasma unit to the reaction chamber and to maintain steady-state operation of remote plasma unit; a controller coupled to the pressure control device and to the control valve and configured to control the pressure control device and the control valve to maintain steady-state operation of the remote plasma unit when the intermediate reactive species are pulsed to the reaction chamber using the control valve to switch a flow of the intermediate reactive species between the reaction chamber and the vacuum source; and a catalyst between the remote plasma unit and the control valve, the catalyst comprising a material selected from the group consisting of, iron, magnesium oxide (MgO), titanium oxide (TiO2), platinum, palladium, and rhodium.",
"20. The remote plasma system of claim 19, further comprising a conductance match region between the remote plasma unit and the vacuum source."
],
"description_excerpt": "The disclosure generally relates to vapor-phase methods and systems. More particularly, exemplary embodiments of the present disclosure relate to systems and methods for forming intermediate reactive species useful in vapor-phase processes.\n\nVapor-phase processes are used for a variety of applications. For example, vapor-phase processes are used for chemical vapor deposition to deposit material onto a substrate, vapor-phase etching to remove material from a substrate or a reactor, and vapor-phase treatment processes to treat a surface of a substrate or a reactor.\n\nPrecursors or reactants for vapor-phase processes are generally selected according to a material to be deposited, etched, or treated; i.e., the precursors are generally selected to provide desired vapor-phase reactants. However, other factors are often used to select between more than one precursor that might be suitable for a particular application. For example, a reactivity or selectivity of a precursor may be a factor in the selection of the precursor. Another consideration for selecting a precursor is the stability of the precursor - e.g., does the precursor break down into other compounds before the precursor has a chance to take part in a desired reaction. Yet further considerations may include toxicity of a precursor, availability of the precursor, and cost of the precursor. Thus, a precursor that might have better properties, such as higher selectivity, reactivity, and/or provide more uniform deposition, etch, or treatment, may not be selected for a particular application, because the precursor is relatively expensive and/or toxic.",
"cpc": [
"H01J 37/32422",
"B08B 7/0035",
"C23C 16/452",
"C23C 16/45557",
"C23C 16/50",
"C23C 16/52",
"H01J 2237/3321",
"H01J 2237/334",
"H01J 2237/335",
"H01J 37/32357",
"H01J 37/32449",
"H01J 37/32862"
],
"ipc": [
"H01J 37/32",
"C23C 16/00",
"C23C 16/452",
"C23C 16/455",
"C23C 16/52",
"C23F 1/00",
"H01L 21/306"
],
"assignees": [
"ASM IP Holding BV"
],
"inventors": [
"Jereld Lee Winkler"
],
"filing_date": "2013-03-08",
"publication_date": "2017-03-07",
"grant_date": "2017-03-07",
"priority_date": "2013-03-08",
"application_number": "US-201313791246-A",
"family_id": "51486558",
"cited_by_count": 484,
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Record 4,234 of 8,000 in Patents full text (MLC-0201). Request the full dataset.