Metal oxide protective layer for a semiconductor device

{
  "publication_number": "US9384987B2",
  "country": "US",
  "kind": "B2",
  "title": "Metal oxide protective layer for a semiconductor device",
  "abstract": "Embodiments related to metal oxide protective layers formed on a surface of a halogen-sensitive metal-including layer present on a substrate processed in a semiconductor processing reactor are provided. In one example, a method for forming a metal oxide protective layer is provided. The example method includes forming a metal-including active species on the halogen-sensitive metal-including layer, the metal-including active species being derived from a non-halogenated metal oxide precursor. The example method also includes reacting an oxygen-containing reactant with the metal-including active species to form the metal oxide protective layer.",
  "claims": [
    "1. A method of forming a metal oxide protective layer on a surface of a halogen-sensitive metal-including layer present on a substrate processed in a semiconductor processing reactor, the method comprising the steps of: providing a halogen-sensitive metal-including layer present on a substrate; forming a metal oxide protective layer overlying the halogen-sensitive metal-including layer, the metal oxide protective layer derived from a non-halogenated metal oxide precursor; and forming a high-k dielectric metal-including film overlaying the metal oxide protective layer by exposing the metal oxide protective layer to a halogen-including metal compound.",
    "2. The method of claim 1, wherein the step of forming a metal oxide protective layer comprises using at least a portion of a surface of the halogen-sensitive metal-including layer.",
    "3. The method of claim 1, wherein the step of forming a metal oxide protective layer comprises reacting an oxygen-containing reactant with an active species of the metal-including layer.",
    "4. The method of claim 1, wherein the metal oxide protective layer is a barrier layer.",
    "5. The method of claim 1, wherein the metal oxide protective layer is a buffer layer.",
    "6. The method of claim 1, where the halogen-sensitive metal-including layer is sensitive to chlorine and where the non-halogenated metal oxide precursor comprises a non-chlorinated metal oxide precursor.",
    "7. The method of claim 1, wherein the halogen-sensitive metal-including layer comprises an alkaline earth metal-including oxide.",
    "8. The method of claim 1, wherein the halogen-sensitive metal-including layer comprise one or more of SrTi x O y, BaTi x O y, SrO, and Sr x Ba(1-x).",
    "9. The method of claim 1, wherein the metal oxide protective layer excludes alkaline earth metals.",
    "10. The method of claim 1, wherein the metal oxide protective layer comprises titanium oxide.",
    "11. The method of claim 1, wherein the metal oxide protective layer comprises aluminum oxide.",
    "12. A method of fabricating a semiconductor device, the method comprising the steps of: forming a halogen-sensitive high-K dielectric material on a substrate; forming a metal oxide protective layer on the halogen-sensitive high-K dielectric material; and forming a high-k dielectric metal-including film overlying the metal oxide protective layer by exposing the metal oxide protective layer to a halogen-including metal compound.",
    "13. The method of claim 12, wherein a pressure during the step of forming a metal oxide protective layer is ranges from 0.1 Torr to 10 Torr.",
    "14. The method of claim 12, wherein a temperature during the step of forming a metal oxide protective layer is ranges from 100° C. to 400° C.",
    "15. The method of claim 12, wherein the step of forming a metal oxide protective layer comprises using a precursor selected from the group consisting of: titanium tetraethoxide (Ti(OC 2 H 5) 4), titanium tetramethoxide (Ti(OCH 3) 4), titanium tetraisopropoxide (Ti(i-OC 3 H 7) 4, and titanium tetra-n-butoxide (Ti(n-OC 4 H 9) 4)); transition metal amino complexes (e.g., tetrakis(dimethylamido)titanium (Ti(N(CH 3) 2) 4) and tetrakis(diethylamido)titanium (Ti(N(C 2 H 5) 2) 4)); transition metal silanes (e.g., tetrakis(trimethylsilylmethyl)titanium (Ti((CH 3)SiCH 2) 4)); and transition metal cyclopentadiene complexes (e.g., (η8-cyclooctatetraene)(η5-cyclopentadienyetitanium (C 13 H 13 Ti), di-1,3-cyclopentadien-1-yl [bis(N-methylmethanaminato)]titanium (C 14 H 22 N 2 Ti), and dicyclopentadienyl titanium diazide (C 10 H 10 N 6 Ti).",
    "16. The method of claim 12, wherein the step of forming a metal oxide protective layer comprises using a precursor selected from the group consisting of: aluminum alkyl complexes, aluminum alkoxides, aluminum silanes, aluminum amino complexes, and aluminum cyclopentadiene complexes.",
    "17. A method of forming a metal oxide protective layer on a surface of a halogen-sensitive metal-including layer present on a substrate processed in a semiconductor processing reactor, the method comprising the steps of: providing a halogen-sensitive metal-including layer present on a substrate; using atomic layer deposition, forming a metal oxide protective layer overlying the halogen-sensitive metal-including layer, the metal oxide protective layer derived from a non-halogenated metal oxide precursor; and forming a high-k dielectric metal-including film comprising residual halogen atoms overlying the metal oxide protective layer.",
    "18. The method of claim 17, wherein the film comprising residual halogen atoms comprises a transition metal compound.",
    "19. The method of claim 17, wherein the halogen-sensitive high-K dielectric material comprises an alkaline earth metal-including metal.",
    "20. The method of claim 17, wherein the metal oxide protective layer has a thickness of 20 Å or less."
  ],
  "description_excerpt": "Some semiconductor devices employ a high-K dielectric material (relative to SiO 2) as a gate dielectric to achieve a desired equivalent oxide thickness (EOT) with a film that is sufficiently thick to avoid undesirable leakage. However, some high-K dielectric materials may be incompatible with subsequently deposited materials. In some settings, the effect of such incompatibilities may compromise device performance.\n\nVarious embodiments are disclosed herein that relate to forming a metal oxide protective layer on a surface of a halogen-sensitive metal-including layer present on a substrate processed in a semiconductor processing reactor. For example, one embodiment provides a method for forming a metal oxide protective layer comprising forming a metal-including active species on the halogen-sensitive metal-including layer, the metal-including active species being derived from a non-halogenated metal oxide precursor. The example method also includes reacting an oxygen-containing reactant with the metal-including active species to form the metal oxide protective layer.\n\nThis Summary is provided to introduce a selection of concepts in a simplified form that are further described below in the Detailed Description. This Summary is not intended to identify key features or essential features of the claimed subject matter, nor is it intended to be used to limit the scope of the claimed subject matter. Furthermore, the claimed subject matter is not limited to implementations that solve any or all disadvantages noted in any part of this disclosure.",
  "cpc": [
    "H10D 64/0135",
    "C23C 16/405",
    "C23C 16/409",
    "C23C 16/45527",
    "H01L 21/02186",
    "H01L 21/02197",
    "H01L 21/022",
    "H01L 21/0228",
    "H01L 21/02362",
    "H01L 21/28194",
    "H01L 21/28229",
    "H01L 29/513",
    "H01L 29/517",
    "H10D 64/01342",
    "H10D 64/685",
    "H10D 64/691",
    "H10P 14/6339",
    "H10P 14/6548",
    "H10P 14/662",
    "H10P 14/69394",
    "H10P 14/69398"
  ],
  "ipc": [
    "H10P 14/24",
    "H10P 14/60",
    "H10P 14/692",
    "C23C 16/40",
    "C23C 16/455",
    "H01L 29/51"
  ],
  "assignees": [
    "ASM IP Holding BV"
  ],
  "inventors": [
    "Sung-Hoon Jung"
  ],
  "filing_date": "2014-12-15",
  "publication_date": "2016-07-05",
  "grant_date": "2016-07-05",
  "priority_date": "2012-04-04",
  "application_number": "US-201414571126-A",
  "family_id": "49291631",
  "cited_by_count": 501,
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