Patents full text · MLC-0201
CPC subclass H01J
Electric discharge tubes or discharge lamps
| No. | Publication | Title | Published | Assignee |
|---|---|---|---|---|
| 1 | US2026106122A1 | Dry chamber clean using thermal and plasma processes | 2026-04-16 | |
| 2 | US12004337B2 | Ultrathin conformal coatings for electrostatic dissipation in semiconductor process tools | 2024-06-04 | APPLIED MATERIALS INC |
| 3 | US11955326B2 | Multi-device removal and installation tool | 2024-04-09 | AGILENT TECHNOLOGIES INC |
| 4 | US11309168B2 | Vacuum processing apparatus and maintenance apparatus | 2022-04-19 | TOKYO ELECTRON LTD |
| 5 | US11268930B2 | Triggered sampling systems and methods | 2022-03-08 | PARTICLE MEASURING SYST |
| 6 | US2022020575A1 | Apparatus for treating substrate, method for measuring height difference between lift pins, and computer readable recording medium having processing program stored therein | 2022-01-20 | SEMES CO LTD |
| 7 | US11127559B2 | Portable vacuum antioxidant bag | 2021-09-21 | KOREA INST SCI & TECH |
| 8 | US2021241992A1 | Examining, analyzing and/or processing an object using an object receiving container | 2021-08-05 | ZEISS CARL MICROSCOPY GMBH |
| 9 | US10589251B2 | Equipment protecting enclosures | 2020-03-17 | XYLECO INC |
| 10 | US10549241B2 | Enclosures for treating materials | 2020-02-04 | XYLECO INC |
| 11 | US10276355B2 | Multi-zone reactor, system including the reactor, and method of using the same | 2019-04-30 | ASM IP HOLDING BV |
| 12 | US10163535B2 | Processing materials | 2018-12-25 | XYLECO INC |
| 13 | US10153140B2 | Method of installing elastomer ring in semiconductor processing equipment and guiding sheet and jig used in installing elastomer ring | 2018-12-11 | MFC SEALING TECH CO LTD |
| 14 | US9777430B2 | Reconfigurable processing enclosures | 2017-10-03 | XYLECO INC |
| 15 | US9644266B2 | Film forming apparatus, gas supply device and film forming method | 2017-05-09 | TOKYO ELECTRON LTD |
| 16 | US9556496B2 | Processing biomass | 2017-01-31 | XYLECO INC |
| 17 | US9455118B1 | Processing materials | 2016-09-27 | XYLECO INC |
| 18 | US2016163561A1 | Technique to deposit sidewall passivation for high aspect ratio cylinder etch | 2016-06-09 | LAM RES CORP |
| 19 | US2013162134A1 | Device for producing an electron beam | 2013-06-27 | MATTAUSCH GOESTA |
| 20 | US6776848B2 | Motorized chamber lid | 2004-08-17 | APPLIED MATERIALS INC |
| 21 | US6753498B2 | Automated electrode replacement apparatus for a plasma processing system | 2004-06-22 | TOKYO ELECTRON LTD |
| 22 | US6660662B2 | Method of reducing plasma charge damage for plasma processes | 2003-12-09 | APPLIED MATERIALS INC |
| 23 | US6641746B2 | Control of semiconductor processing | 2003-11-04 | AGERE SYSTEMS INC |
| 24 | US6558902B1 | Infrared matrix-assisted laser desorption/ionization mass spectrometric analysis of macromolecules | 2003-05-06 | SEQUENOM INC |
| 25 | US6498107B1 | Interface control for film deposition by gas-cluster ion-beam processing | 2002-12-24 | EPION CORP |
| 26 | US6440282B1 | Sputtering reactor and method of using an unbalanced magnetron | 2002-08-27 | APPLIED MATERIALS INC |
| 27 | US6436251B2 | Vault-shaped target and magnetron having both distributed and localized magnets | 2002-08-20 | APPLIED MATERIALS INC |
| 28 | US6412437B1 | Plasma enhanced chemical vapor deposition reactor and plasma enhanced chemical vapor deposition process | 2002-07-02 | MICRON TECHNOLOGY INC |
| 29 | US6397776B1 | Apparatus for large area chemical vapor deposition using multiple expanding thermal plasma generators | 2002-06-04 | GEN ELECTRIC |
| 30 | US6376989B1 | Dimmable discharge lamp for dielectrically impeded discharges | 2002-04-23 | PATENT TREUHAND GES FUER ELEKTRISCHE GLUEHLAMPEN MBH |
| 31 | US6327339B1 | Industrial x-ray/electron beam source using an electron accelerator | 2001-12-04 | |
| 32 | US6235478B1 | DNA diagnostics based on mass spectrometry | 2001-05-22 | SEQUENOM INC |
| 33 | US6221605B1 | DNA diagnostics based on mass spectrometry | 2001-04-24 | SEQUENOM INC |
| 34 | US6123775A | Reaction chamber component having improved temperature uniformity | 2000-09-26 | LAM RES CORP |
| 35 | US6116257A | Micromotors, linear motors, micropumps, methods of using the same, microactuators, methods of controlling flow properties of fluids, and apparatuses for controlling flow properties of fluids | 2000-09-12 | NEW TECHNOLOGY MANAGEMENT CO L |
| 36 | US5942074A | Single-piece gas director for plasma reactors | 1999-08-24 | LAM RES CORP |
| 37 | US5798139A | Apparatus for and method of manufacturing plastic container coated with carbon film | 1998-08-25 | KIRIN BREWERY |
| 38 | US5705079A | Method for forming spacers in flat panel displays using photo-etching | 1998-01-06 | MICRON DISPLAY TECH INC |
| 39 | US5665167A | Plasma treatment apparatus having a workpiece-side electrode grounding circuit | 1997-09-09 | TOKYO ELECTRON LTD |
| 40 | US5422139A | Method for a reactive surface treatment of a workpiece and a treatment chamber for practicing such method | 1995-06-06 | BALZERS HOCHVAKUUM |
| 41 | US5270552A | Method for separating specimen and method for analyzing the specimen separated by the specimen separating method | 1993-12-14 | HITACHI LTD |
| 42 | US5259877A | Apparatus with changeover grooves for forming phosphor layer in cathode-ray tube | 1993-11-09 | SONY CORP |
| 43 | US5236512A | Method and apparatus for cleaning surfaces with plasma | 1993-08-17 | THIOKOL CORP |
| 44 | US5156727A | Film thickness uniformity control apparatus for in-line sputtering systems | 1992-10-20 | VIRATEC THIN FILMS INC |
| 45 | US4305000A | Process of and apparatus for cold-cathode electron-beam generation for sterilization of surfaces and similar applications | 1981-12-08 | TETRA PAK DEV |
| 46 | US4101411A | Plasma etching apparatus | 1978-07-18 | HITACHI LTD |
| 47 | US3814356A | Electron microscope | 1974-06-04 | COLEMAN J |
47 records in this listing. Patents full text (MLC-0201). Request the full dataset.