Target retaining apparatus

{
  "publication_number": "US10199204B2",
  "country": "US",
  "kind": "B2",
  "title": "Target retaining apparatus",
  "abstract": "Embodiments of target retaining apparatus and substrate processing chambers incorporating same are provided herein. In some embodiments, a target retaining apparatus includes a housing including a first slot and a second slot; a cam movably disposed in the housing, wherein movement of the cam is constrained along the first slot; a retaining arm movably coupled to the cam, wherein movement of the retaining arm is constrained along the second slot; a linking member including a first end rotatably coupled to the cam and a second end rotatably coupled to the retaining arm; and a biasing element biasing the cam towards a first position in which the retaining arm extends away from the housing.",
  "claims": [
    "1. A target retaining apparatus for retaining a sputtering target in a physical vapor deposition chamber, comprising: a housing, configured to be coupled to a lid assembly of a process chamber, including a first slot and a second slot; a cam movably disposed in the housing, wherein movement of the cam is constrained along the first slot; a retaining arm movably coupled to the cam, wherein movement of the retaining arm is constrained along the second slot; a linking member including a first end rotatably coupled to the cam and a second end rotatably coupled to the retaining arm; and a biasing element biasing the cam in a direction away from the housing and towards a first position in which the retaining arm extends away from the housing.",
    "2. The target retaining apparatus of claim 1, wherein the first slot is perpendicular to the second slot.",
    "3. The target retaining apparatus of claim 1, wherein when the cam is in the first position, the biasing element causes the cam to extend beyond the housing.",
    "4. The target retaining apparatus of claim 1, further comprising: a guide element to orient a bias force of the biasing element in a direction that is normal to an upward facing surface of the cam.",
    "5. The target retaining apparatus of claim 1, wherein the retaining arm is in a retracted position when the cam is in a second position, and wherein, when the cam is in the second position, the cam is retracted into the housing.",
    "6. The target retaining apparatus of claim 5, wherein the cam is in the second position when a force applied to the cam is greater than a bias force of the biasing element.",
    "7. The target retaining apparatus of claim 1, further comprising: a flange having a plurality of openings to receive a corresponding plurality of fasteners to couple the housing to a lid assembly of a process chamber.",
    "8. The target retaining apparatus of claim 1, wherein the cam includes a first protrusion extending through the first slot to constrain movement of the cam along the first slot, and wherein the retaining arm includes a second protrusion extending through the second slot to constrain movement of the retaining arm along the second slot.",
    "9. A process chamber, comprising: a chamber body; a lid assembly disposed on an upper surface of the chamber body; a target disposed within the lid assembly; a substrate support disposed within the chamber body; and a target retaining device coupled to the lid assembly, the target retaining device comprising: a housing including a first slot and a second slot; a cam movably disposed in the housing, wherein movement of the cam is constrained along the first slot; a retaining arm movably coupled to the cam, wherein movement of the retaining arm is constrained along the second slot; a linking member including a first end rotatably coupled to the cam and a second end rotatably coupled to the retaining arm; and a biasing element biasing the cam in a direction away from the housing and towards a first position in which the retaining arm extends away from the housing and toward the target.",
    "10. The process chamber of claim 9, wherein the first slot is perpendicular to the second slot.",
    "11. The process chamber of claim 9, wherein the biasing element is a compression spring.",
    "12. The process chamber of claim 11, wherein the target retaining apparatus further comprises a guide element to orient a bias force of the biasing element in a direction that is normal to an upward facing surface of the cam.",
    "13. The process chamber of claim 9, wherein the retaining arm is in a retracted position when the cam is in a second position.",
    "14. The process chamber of claim 13, wherein the cam is in the second position when a force applied to the cam is greater than a bias force of the biasing element.",
    "15. The process chamber of claim 9, wherein the target retaining apparatus further comprises a flange having a plurality of openings to receive a corresponding plurality of fasteners to couple the housing to the lid assembly via a corresponding plurality of threaded holes in the lid assembly.",
    "16. A target retaining apparatus for retaining a sputtering target in a physical vapor deposition chamber, comprising: a housing, configured to be coupled to a lid assembly of a process chamber, including a first slot and a second slot perpendicular to the first slot; a cam movably disposed in the housing, wherein the cam includes a first protrusion extending through the first slot to constrain movement of the cam along the first slot; a retaining arm movably coupled to the cam, wherein the retaining arm includes a second protrusion extending through the second slot to constrain movement of the retaining arm along the second slot; a linking member including a first end rotatably coupled to the cam and a second end rotatably coupled to the retaining arm; and a compression spring biasing the cam in a direction away from the housing towards a first position in which the retaining arm extends away from the housing.",
    "17. The target retaining apparatus of claim 16, further comprising: a guide element to orient a bias force of the compression spring in a direction that is normal to an upward facing surface of the cam.",
    "18. The target retaining apparatus of claim 16, wherein the retaining arm is in a retracted position when the cam is in a second position.",
    "19. The target retaining apparatus of claim 18, wherein the cam is in the second position when a force applied to the cam is greater than a bias force of the compression spring.",
    "20. The target retaining apparatus of claim 16, further comprising: a flange having a plurality of openings to receive a corresponding plurality of fasteners to couple the housing to the lid assembly of the process chamber."
  ],
  "description_excerpt": "Embodiments of the present disclosure generally relate to substrate processing equipment.\n\nFormation of some devices on substrates entails depositing multiple layers of thin films in a deposition chamber, such as a physical vapor deposition (PVD) chamber. The thin films are deposited from a target via a sputtering process. The target is generally disposed opposite the workpiece, or substrate, upon which deposition is performed. The target may be, for example, secured to a lid of the process chamber. However, the inventors have observed that if the target has not been correctly bolted onto the lid of the process chamber, there is a risk that the improperly secured target will drop on the floor, risking injury to personnel and damage to the target or other equipment. In embodiments where the target has a round shape, the target may further roll around on the floor, potentially causing further damage to the target and/or to personnel or surrounding equipment.\n\nTherefore, the inventors have provided an improved target retaining apparatus.\n\nEmbodiments of target retaining apparatus and substrate processing chambers incorporating same are provided herein.",
  "cpc": [
    "H01J 37/3435"
  ],
  "ipc": [
    "B25B 5/08",
    "C23C 14/50",
    "H01J 37/34"
  ],
  "assignees": [
    "Applied Materials Inc"
  ],
  "inventors": [
    "Srinivasa Yedla",
    "Sundarapandian Reddy",
    "Uday Pai",
    "Kirankumar Savandaiah",
    "Thanh X. Nguyen",
    "Muhammad M. Rasheed",
    "Jallepally Ravi"
  ],
  "filing_date": "2015-01-20",
  "publication_date": "2019-02-05",
  "grant_date": "2019-02-05",
  "priority_date": "2014-01-17",
  "application_number": "US-201514600915-A",
  "family_id": "53544276",
  "cited_by_count": 0,
  "citations": [
    "JPH02285069A",
    "US20080202910A1"
  ]
}