Process for producing a strong bond between copper layers and ceramic

{
  "publication_number": "US5648123A",
  "country": "US",
  "kind": "A",
  "title": "Process for producing a strong bond between copper layers and ceramic",
  "abstract": "The invention relates to a process for producing a strong bond between copper layers, which have been applied by means of thermal spraying of pulverulent copper or copper alloys, and ceramic. Fine copper powder having a mean particle diameter of ≦20 μm is applied to the ceramic surface by means of thermal spraying.",
  "claims": [
    "1. A process for producing a bond between copper and ceramic, wherein said copper has been applied by thermal spraying pulverulent copper or copper alloys, said process comprising applying fine powder of copper or copper alloys having a mean particle diameter of ≦20 μm to a ceramic surface by thermal spraying said copper or copper alloys, wherein the surface roughness R z of the coated copper or copper alloys is in the range of ≦10 μm.",
    "2. The process as claimed in claim 1, wherein the ceramic material used is selected from the group consisting of aluminum oxide, beryllium oxide, zirconium oxide and aluminum nitride.",
    "3. The process as claimed in claim 1, wherein the ceramic surface is subjected to a roughening process, and is cleaned and dried at temperatures of at least 180° C. for a period of at least 24 hours, prior to applying the fine powder of copper or copper alloys.",
    "4. The process as claimed in claim 3, wherein said roughening process comprises treating a surface of said ceramic component with mineral acids.",
    "5. The process as claimed in claim 3, wherein said ceramic has a surface roughness R z of from about 2 to 5 μm prior to coating.",
    "6. The process as claimed in claim 1, wherein the thermal spraying method used is plasma spraying.",
    "7. The process as claimed in claim 1, wherein the powder of copper or a copper alloy has a particle size d 50 in the range from 8 to 12μm, and noble metals selected from the group consisting of silver, gold and palladium in amounts of up to 30% are alloyed with the copper as alloy constituents.",
    "8. The process as claimed in claim 1, wherein the copper powder has a purity of at least 99%, with its phosphorus content being in the range from 0.08 to 0.15% and its oxygen content being in the range from 0.2 to 0.3.",
    "9. The process as claimed in claim 1, wherein the coated ceramic is additionally subjected to subsequent heat treatment in a reducing atmosphere at temperatures in the range from 600° to 800° C. over a period of at least 5 minutes.",
    "10. The process as claimed in claim 1, wherein the ceramic to be coated is cooled during the coating process.",
    "11. The process as claimed in claim 10, wherein cooling is carried out using CO 2 in crystalline or liquid form at pressures in the range of from 40 to 60 bar.",
    "12. The process as claimed in claim 1, wherein the thermal spraying method used is flame spraying.",
    "13. A process for producing a bond between copper and ceramic, wherein said copper has been applied by thermal spraying pulverulent copper or copper alloys, said process comprising applying in a single pass, fine powder of copper or copper alloys having a mean particle diameter of ≦20 μm to a ceramic surface by thermal spraying said copper or copper alloys, wherein the surface roughness R z of the coated copper or copper alloys is in the range of ≦10μm.",
    "14. The process as claimed in claim 13, wherein the ceramic surface is subjected to a roughening process, and is cleaned and dried at temperatures of at least 180° C. for a period of at least 24 hours, prior to applying the fine powder of copper or copper alloys.",
    "15. The process as claimed in claim 14, wherein said ceramic has a surface roughness R z of from about 2 to 5 μm prior to coating.",
    "16. The process as claimed in claim 13, wherein the coated ceramic component is additionally subjected to subsequent heat treatment in a reducing atmosphere at temperatures in the range from 600° to 800° C. over a period of at least 5 minutes.",
    "17. The process as claimed in claim 13, wherein cooling is carried out using CO 2 in crystalline or liquid form.",
    "18. In a process of photolithographic structuring of electrical strip conductors, the improvement comprising using, as the ceramic component of the electrical strip conductor, a coated ceramic component prepared by coating a ceramic component with copper by producing a bond between copper and said ceramic component by applying a fine powder of copper or copper alloys having a mean particle diameter of ≦20 μm to a surface of the ceramic component by thermal spraying, wherein said copper or copper alloys coating has a surface roughness R z the range of ≦10 μm.",
    "19. The process as claimed in claim 18, wherein the coated ceramic component is additionally subjected to subsequent heat treatment in a reducing atmosphere at temperatures in the range of from 600° to 800° C. over a period of at least 5 minutes, wherein said strip conductors have an electrical conductivity of at least 30 m/Ω·mm 2 and a bond strength of at least 20 MPa."
  ],
  "cpc": [
    "C04B 41/009",
    "C04B 41/5127",
    "C04B 41/88",
    "C23C 4/08",
    "H05K 3/14",
    "H10W 70/05"
  ],
  "assignees": [
    "HOECHST AG"
  ],
  "filing_date": "1993-03-19",
  "publication_date": "1997-07-15",
  "grant_date": "1997-07-15",
  "priority_date": "1992-04-02",
  "application_number": "US-30779794-A",
  "family_id": "6455759",
  "citations": [
    "DE3036128A1",
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    "DE3509022A1",
    "DE3824249A1",
    "JPH0385715A",
    "JPS5633485A",
    "JPS61230761A",
    "JPS61231155A",
    "JPS6247470A",
    "JPS6459887A",
    "US4297439A",
    "US4402494A",
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    "US4609408A",
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  ]
}