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Patent · US10483210B2 · B2 · US

Glass articles with non-planar features and alkali-free glass elements

(11) Publication number
US10483210B2
(21) Application number
15/523,759
(22) Filing date
2015-11-04
(30) Priority date
2014-11-05
(43) Publication date
2019-11-19
(45) Date of grant
2019-11-19
(51) IPC
B32B 17/06; C03C 15/00; C03C 17/00; C03C 17/32; H01L 29/786; H10K 99/00; H10W 70/692
(52) CPC
  • B32B Layered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form: 17/10, 17/064, 2457/206
  • C03C Chemical composition of glasses, glazes or vitreous enamels; surface treatment of glass; surface treatment of fibres or filaments made from glass, minerals or slags; joining glass to glass or other materials: 15/00, 17/007, 17/322, 17/326, 2217/43, 2217/445, 2217/478
  • H01L Semiconductor devices; electric solid state devices not otherwise provided for: 2251/303, 2251/5338, 2251/558, 23/15, 23/5387, 29/78603, 51/0097, 51/524, 51/5253, 51/56
  • H10D Inorganic electric semiconductor devices: 30/6758
  • H10K Organic electric solid-state devices: 2102/00, 2102/311, 2102/351, 59/871, 59/873, 71/00, 77/111
  • H10W Generic packages, interconnections, connectors or other constructional details of devices covered by class H10: 70/611, 70/688, 70/692
  • Y02E Reduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution: 10/549
  • Y02P Climate change mitigation technologies in the production or processing of goods: 40/57, 70/50, 70/521
(73) Assignee
Corning Inc
(72) Inventors
Timothy Michael Gross; Paul John Shustack; Wendell Porter Weeks
(54) Title
Glass articles with non-planar features and alkali-free glass elements
(57) Abstract

An electronic device assembly includes a backplane having a glass composition substantially free of alkali ions, an elastic modulus of about 40 GPa to about 100 GPa, and a final thickness from about 20 μm to about 100 μm. The primary surfaces of the backplane are characterized by a prior material removal to the final thickness from an initial thickness that is at least 20 μm greater than the final thickness. The assembly also includes a protect layer on the first primary surface of the backplane; and a plurality of electronic components on the second primary surface of the backplane. In addition, the backplane is configured with at least one static bend having a bend radius between about 25 mm and about 5 mm. The electronic components of the electronic device assembly can include at least one thin film transistor (TFT) element or organic light emitting diode (OLED) element.

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Claims (19)

  1. An electronic device assembly, comprising: a backplane having a glass composition substantially free of alkali ions, an elastic modulus of about 40 GPa to about 100 GPa, a final thickness from about 20 μm to about 100 μm, a first primary surface, and a second primary surface, the primary surfaces characterized by a prior material removal to the final thickness from an initial thickness that is at least 20 μm greater than the final thickness; a protect layer on the first primary surface of the backplane; and a plurality of electronic components on the second primary surface of the backplane, wherein the backplane is configured with at least one static bend having a bend radius between about 25 mm and about 5 mm, and further comprising: a cover over the plurality of electronic components, the cover having a glass composition, and at least one curved feature having a radius substantially equivalent to the bend radius, wherein the cover is further characterized by: (a) an optical transmissivity of at least 90%; (b) a puncture resistance of greater than about 1.5 kgf when a first primary surface of the cover is supported by (i) an approximately 25 μm thick pressure-sensitive adhesive having an elastic modulus of less than about 1 GPa and (ii) an approximately 50 μm thick polyethylene terephthalate layer having an elastic modulus of less than about 10 GPa, and a second primary surface of the cover is loaded with a stainless steel pin having a flat bottom with a 200 μm diameter; and (c) a pencil hardness of greater than or equal to 8H.
  2. The electronic device assembly according to claim 1, wherein the protect layer comprises nano-silica particulate and at least one of epoxy and urethane materials.
  3. The electronic device assembly according to claim 1, wherein the composition of the backplane has less than 0.5 mol % of each of Li 2 O, Na 2 O, K 2 O, Rb 2 O and Cs 2 O.
  4. The electronic device assembly according to claim 1, wherein the electronic components comprise at least one thin film transistor element or at least one OLED element.
  5. The electronic device assembly according to claim 1, the cover having a thickness from about 25 μm to about 125 μm, and further comprising: a compressive stress region extending from the first primary surface of the cover to a first depth in the cover, the region defined by a compressive stress of at least about 100 MPa at the first primary surface of the cover.
  6. The electronic device assembly according to claim 5, wherein the electronic device assembly has a total thickness of 250 μm or less.
  7. The electronic device assembly according to claim 1, further comprising: an encapsulant located beneath the cover and joined to the backplane, the encapsulant configured to encapsulate the plurality of electronic components.
  8. The electronic device assembly according to claim 1, further comprising: an encapsulant located beneath the cover and joined to the backplane, the encapsulant configured to encapsulate the plurality of electronic components, wherein the encapsulant has a thickness from about 25 μm to about 125 μm and further comprises: (a) a glass layer having an optical transmissivity of at least 90%, and a first primary surface; and (b) a compressive stress region extending from the first primary surface of the glass layer to a first depth in the glass layer, the region defined by a compressive stress of at least about 100 MPa at the first primary surface of the glass layer, wherein the encapsulant is further characterized by at least one curved feature having a radius substantially equivalent to the bend radius.
  9. The electronic device assembly according to claim 8, wherein the glass layer has a glass composition substantially free of alkali ions.
  10. The electronic device assembly according to claim 8, wherein the electronic device assembly has a total thickness of about 375 μm or less.
  11. The electronic device assembly according to claim 1, wherein the backplane further comprises at least one edge disposed between the first and second primary surfaces, and wherein the protect layer is disposed on the at least one edge.
  12. A method of forming an electronic device assembly, comprising the steps: forming a backplane having a glass composition substantially free of alkali ions, an elastic modulus of about 40 GPa to about 100 GPa, an initial thickness that is at least 20 μm greater than a final thickness, a first primary surface, and a second primary surface; removing material from the initial thickness of the backplane to define the final thickness, the final thickness from about 20 μm to about 100 μm; forming a protect layer on the first primary surface of the backplane; after forming the protect layer, disposing a plurality of electronic components on the second primary surface of the backplane; forming at least one static bend in the backplane after the step of disposing the plurality of electronic components on the second primary surface of the backplane, the static bend having a bend radius between about 25 mm and about 5 mm; sealing the backplane with an encapsulant; and encapsulating the plurality of electronic components with the encapsulant, wherein the encapsulant comprises: (a) a thickness from about 25 μm to about 125 μm; (b) a glass layer having an optical transmissivity of at least 90%, (c) a first primary surface; (d) a compressive stress region extending from the first primary surface of the glass layer to a first depth in the glass layer, the region defined by a compressive stress of at least about 100 MPa at the first primary surface of the glass layer; and (e) at least one curved feature having a radius substantially equivalent to the bend radius of the static bend in the backplane.
  13. The method according to claim 12, wherein the protect layer comprises nano-silica particulate and at least one of epoxy and urethane materials.
  14. The method according to claim 12, wherein the composition of the backplane has less than 0.5 mol % of each of Li 2 O, Na 2 O, K 2 O, Rb 2 O and Cs 2 O.
  15. The method according to claim 12, wherein the electronic components comprise at least one thin film transistor element or at least one OLED element.
  16. The method according to claim 12, wherein the glass layer has a glass composition substantially free of alkali ions.
  17. The method according to claim 12, further comprising the step: bending the encapsulant to form the at least one curved feature before the step of sealing the encapsulant to the backplane.
  18. The method according to claim 12, wherein the electronic device assembly has a total thickness of about 375 μm or less.
  19. The method according to claim 12, wherein the sealing step comprises frit sealing the encapsulant to the backplane.

Description

The disclosure generally relates to glass articles, stack assemblies and electronic device assemblies having one or more static, non-planar features, and various methods for making them. More particularly, the disclosure relates to versions of these articles and assemblies containing alkali-free glass elements, along with methods for making them.

Flexible and curved versions of products and components that are traditionally rigid and/or planar in nature are being conceptualized for new applications. For example, flexible electronic devices can provide thin, lightweight and flexible properties that offer opportunities for new applications, for example curved displays and wearable devices. Many of these flexible electronic devices require flexible substrates for holding and mounting the electronic components of these devices. Polymeric foils have some advantages including resistance to fatigue failure, but suffer from marginal optical transparency, lack of thermal stability and limited hermeticity. When polymeric foils are employed as backplanes or substrates for electronic devices, their limited temperature resistance significantly limits processing and manufacturing of the electronic components employed in these devices.

Some of these electronic devices having static, non-planar features also can make use of flexible displays.

Citations (74)

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Record as JSON 
{
  "publication_number": "US10483210B2",
  "country": "US",
  "kind": "B2",
  "title": "Glass articles with non-planar features and alkali-free glass elements",
  "abstract": "An electronic device assembly includes a backplane having a glass composition substantially free of alkali ions, an elastic modulus of about 40 GPa to about 100 GPa, and a final thickness from about 20 μm to about 100 μm. The primary surfaces of the backplane are characterized by a prior material removal to the final thickness from an initial thickness that is at least 20 μm greater than the final thickness. The assembly also includes a protect layer on the first primary surface of the backplane; and a plurality of electronic components on the second primary surface of the backplane. In addition, the backplane is configured with at least one static bend having a bend radius between about 25 mm and about 5 mm. The electronic components of the electronic device assembly can include at least one thin film transistor (TFT) element or organic light emitting diode (OLED) element.",
  "claims": [
    "1. An electronic device assembly, comprising: a backplane having a glass composition substantially free of alkali ions, an elastic modulus of about 40 GPa to about 100 GPa, a final thickness from about 20 μm to about 100 μm, a first primary surface, and a second primary surface, the primary surfaces characterized by a prior material removal to the final thickness from an initial thickness that is at least 20 μm greater than the final thickness; a protect layer on the first primary surface of the backplane; and a plurality of electronic components on the second primary surface of the backplane, wherein the backplane is configured with at least one static bend having a bend radius between about 25 mm and about 5 mm, and further comprising: a cover over the plurality of electronic components, the cover having a glass composition, and at least one curved feature having a radius substantially equivalent to the bend radius, wherein the cover is further characterized by: (a) an optical transmissivity of at least 90%; (b) a puncture resistance of greater than about 1.5 kgf when a first primary surface of the cover is supported by (i) an approximately 25 μm thick pressure-sensitive adhesive having an elastic modulus of less than about 1 GPa and (ii) an approximately 50 μm thick polyethylene terephthalate layer having an elastic modulus of less than about 10 GPa, and a second primary surface of the cover is loaded with a stainless steel pin having a flat bottom with a 200 μm diameter; and (c) a pencil hardness of greater than or equal to 8H.",
    "2. The electronic device assembly according to claim 1, wherein the protect layer comprises nano-silica particulate and at least one of epoxy and urethane materials.",
    "3. The electronic device assembly according to claim 1, wherein the composition of the backplane has less than 0.5 mol % of each of Li 2 O, Na 2 O, K 2 O, Rb 2 O and Cs 2 O.",
    "4. The electronic device assembly according to claim 1, wherein the electronic components comprise at least one thin film transistor element or at least one OLED element.",
    "5. The electronic device assembly according to claim 1, the cover having a thickness from about 25 μm to about 125 μm, and further comprising: a compressive stress region extending from the first primary surface of the cover to a first depth in the cover, the region defined by a compressive stress of at least about 100 MPa at the first primary surface of the cover.",
    "6. The electronic device assembly according to claim 5, wherein the electronic device assembly has a total thickness of 250 μm or less.",
    "7. The electronic device assembly according to claim 1, further comprising: an encapsulant located beneath the cover and joined to the backplane, the encapsulant configured to encapsulate the plurality of electronic components.",
    "8. The electronic device assembly according to claim 1, further comprising: an encapsulant located beneath the cover and joined to the backplane, the encapsulant configured to encapsulate the plurality of electronic components, wherein the encapsulant has a thickness from about 25 μm to about 125 μm and further comprises: (a) a glass layer having an optical transmissivity of at least 90%, and a first primary surface; and (b) a compressive stress region extending from the first primary surface of the glass layer to a first depth in the glass layer, the region defined by a compressive stress of at least about 100 MPa at the first primary surface of the glass layer, wherein the encapsulant is further characterized by at least one curved feature having a radius substantially equivalent to the bend radius.",
    "9. The electronic device assembly according to claim 8, wherein the glass layer has a glass composition substantially free of alkali ions.",
    "10. The electronic device assembly according to claim 8, wherein the electronic device assembly has a total thickness of about 375 μm or less.",
    "11. The electronic device assembly according to claim 1, wherein the backplane further comprises at least one edge disposed between the first and second primary surfaces, and wherein the protect layer is disposed on the at least one edge.",
    "12. A method of forming an electronic device assembly, comprising the steps: forming a backplane having a glass composition substantially free of alkali ions, an elastic modulus of about 40 GPa to about 100 GPa, an initial thickness that is at least 20 μm greater than a final thickness, a first primary surface, and a second primary surface; removing material from the initial thickness of the backplane to define the final thickness, the final thickness from about 20 μm to about 100 μm; forming a protect layer on the first primary surface of the backplane; after forming the protect layer, disposing a plurality of electronic components on the second primary surface of the backplane; forming at least one static bend in the backplane after the step of disposing the plurality of electronic components on the second primary surface of the backplane, the static bend having a bend radius between about 25 mm and about 5 mm; sealing the backplane with an encapsulant; and encapsulating the plurality of electronic components with the encapsulant, wherein the encapsulant comprises: (a) a thickness from about 25 μm to about 125 μm; (b) a glass layer having an optical transmissivity of at least 90%, (c) a first primary surface; (d) a compressive stress region extending from the first primary surface of the glass layer to a first depth in the glass layer, the region defined by a compressive stress of at least about 100 MPa at the first primary surface of the glass layer; and (e) at least one curved feature having a radius substantially equivalent to the bend radius of the static bend in the backplane.",
    "13. The method according to claim 12, wherein the protect layer comprises nano-silica particulate and at least one of epoxy and urethane materials.",
    "14. The method according to claim 12, wherein the composition of the backplane has less than 0.5 mol % of each of Li 2 O, Na 2 O, K 2 O, Rb 2 O and Cs 2 O.",
    "15. The method according to claim 12, wherein the electronic components comprise at least one thin film transistor element or at least one OLED element.",
    "16. The method according to claim 12, wherein the glass layer has a glass composition substantially free of alkali ions.",
    "17. The method according to claim 12, further comprising the step: bending the encapsulant to form the at least one curved feature before the step of sealing the encapsulant to the backplane.",
    "18. The method according to claim 12, wherein the electronic device assembly has a total thickness of about 375 μm or less.",
    "19. The method according to claim 12, wherein the sealing step comprises frit sealing the encapsulant to the backplane."
  ],
  "description_excerpt": "The disclosure generally relates to glass articles, stack assemblies and electronic device assemblies having one or more static, non-planar features, and various methods for making them. More particularly, the disclosure relates to versions of these articles and assemblies containing alkali-free glass elements, along with methods for making them.\n\nFlexible and curved versions of products and components that are traditionally rigid and/or planar in nature are being conceptualized for new applications. For example, flexible electronic devices can provide thin, lightweight and flexible properties that offer opportunities for new applications, for example curved displays and wearable devices. Many of these flexible electronic devices require flexible substrates for holding and mounting the electronic components of these devices. Polymeric foils have some advantages including resistance to fatigue failure, but suffer from marginal optical transparency, lack of thermal stability and limited hermeticity. When polymeric foils are employed as backplanes or substrates for electronic devices, their limited temperature resistance significantly limits processing and manufacturing of the electronic components employed in these devices.\n\nSome of these electronic devices having static, non-planar features also can make use of flexible displays.",
  "cpc": [
    "B32B 17/10",
    "B32B 17/064",
    "B32B 2457/206",
    "C03C 15/00",
    "C03C 17/007",
    "C03C 17/322",
    "C03C 17/326",
    "C03C 2217/43",
    "C03C 2217/445",
    "C03C 2217/478",
    "H01L 2251/303",
    "H01L 2251/5338",
    "H01L 2251/558",
    "H01L 23/15",
    "H01L 23/5387",
    "H01L 29/78603",
    "H01L 51/0097",
    "H01L 51/524",
    "H01L 51/5253",
    "H01L 51/56",
    "H10D 30/6758",
    "H10K 2102/00",
    "H10K 2102/311",
    "H10K 2102/351",
    "H10K 59/871",
    "H10K 59/873",
    "H10K 71/00",
    "H10K 77/111",
    "H10W 70/611",
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    "H10W 70/692",
    "Y02E 10/549",
    "Y02P 40/57",
    "Y02P 70/50",
    "Y02P 70/521"
  ],
  "ipc": [
    "B32B 17/06",
    "C03C 15/00",
    "C03C 17/00",
    "C03C 17/32",
    "H01L 29/786",
    "H10K 99/00",
    "H10W 70/692"
  ],
  "assignees": [
    "Corning Inc"
  ],
  "inventors": [
    "Timothy Michael Gross",
    "Paul John Shustack",
    "Wendell Porter Weeks"
  ],
  "filing_date": "2015-11-04",
  "publication_date": "2019-11-19",
  "grant_date": "2019-11-19",
  "priority_date": "2014-11-05",
  "application_number": "US-201515523759-A",
  "family_id": "54557484",
  "cited_by_count": 52,
  "citations": [
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}

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