MLchartDataset catalogue

Chemical vapor deposition chamber cleaning

Term · Environment · MLC-T-ENV-004822

In the context of semiconductor manufacturing, a process type in which chambers used for depositing thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments.

Table 1. Record
IdentifierMLC-T-ENV-004822
FieldEnvironment
SubjectCommercial processes
References40 CFR 84.3 (CFR 2022)
Record as JSON 
{
  "id": "MLC-T-ENV-004822",
  "term": "Chemical vapor deposition chamber cleaning",
  "field": "Environment",
  "term_source": "Chemical Vapor Deposition Chamber Cleaning",
  "definition": "In the context of semiconductor manufacturing, a process type in which chambers used for depositing thin films are cleaned periodically using plasma-generated fluorine atoms and other reactive fluorine-containing fragments.",
  "subject": "Commercial processes",
  "references": [
    "40 CFR 84.3 (CFR 2022)"
  ],
  "url": "https://mlchart.com/terminology/environment/chemical-vapor-deposition-chamber-cleaning/"
}

Record 4,726 of 29,894 in Environment terminology (MLC-0121). Request the full dataset.