Chamber Cleaning

{
  "id": "MLC-T-ENV-004652",
  "term": "Chamber Cleaning",
  "field": "Environment",
  "definition": "Process type that consists of the process sub-types defined in paragraphs (1) through (3) of this definition.(1) In situ plasma process sub-type consists of the cleaning of thin-film production chambers, after processing substrates, with a fluorinated GHG cleaning reagent that is dissociated into its cleaning constituents by a plasma generated inside the chamber where the film is produced. (2) Remote plasma process sub-type consists of the cleaning of thin-film production chambers, after processing substrates, with a fluorinated GHG cleaning reagent dissociated by a remotely located plasma source.(3) In situ thermal process sub-type consists of the cleaning of thin-film production chambers, after processing substrates, with a fluorinated GHG cleaning reagent that is thermally dissociated into its cleaning constituents inside the chamber where thin films are produced.",
  "references": [
    "40 CFR 98.98 (CFR 2013)"
  ],
  "url": "https://mlchart.com/terminology/environment/chamber-cleaning/"
}