Functional patterning material for imprint lithography processes

{
  "publication_number": "US6936194B2",
  "country": "US",
  "kind": "B2",
  "title": "Functional patterning material for imprint lithography processes",
  "abstract": "The present invention provides a method for forming an optical coupling device on a substrate by disposing a material onto the substrate that is polymerizable in response to actinic radiation. A stack of the material is formed by contacting the material with a template having a stepped-recess formed therein. The material is then solidified into an optically transparent body with a surface having a plurality of steps by subjecting the stack to actinic radiation. To that end, the material may comprise an acrylate component selected from a set of acrylates consisting essentially of ethylene dio diacrylate, t-butyl acrylate, bisphenol A diacrylate, acrylate terminated polysiloxane, polydifluoromethylene diacrylate, perfluoropolyether diacrylates and chlorofluorodiacrylates. Alternatively, the material may include a silylated component selected from a group consisting essentially of (3-acryloxypropyltristrimethylsiloxy) silane.",
  "claims": [
    "1. A method of forming an optical coupling device on a substrate, said method including: forming a stress relief layer on said substrate producing, on said stress relief layer, an optically transparent body with a surface having a plurality of steps by disposing a material onto said stress relief layer, contacting said material with a template having a stepped recess formed therein and solidifying said material by exposing said material to actinic radiation.",
    "2. The method as recited in claim 1 wherein producing further includes disposing said material with an acrylate component selected from a set of acrylates consisting essentially of ethylene diol diacrylate, t-butyl acrylate, bisphenol A diacrylate, acrylate terminated polysiloxane, polydifluoromethylene diacrylate, perfluoropolyether diacrylates and chlorofluorodiacrylates.",
    "3. The method as recited in claim 1 wherein producing further includes disposing said material with a silylated component selected from a group consisting essentially of (3-acryloxypropyltristrimethylsiloxy) silane.",
    "4. The method as recited in claim 1 further including fabricating said substrate from optically transparent material.",
    "5. The method as recited in claim 1 wherein forming further includes fabricating said stress relief layer from rubbers of a set of rubbers consisting essentially of polysiloxane rubber and fluorosilocane rubber.",
    "6. The method as recited in claim 1 wherein producing further includes disposing, on said stress relief layer, said material consisting essentially of ethylene diol diacrylate and an initiator.",
    "7. The method as recited in claim 1 wherein producing further includes disposing, on said stress relief layer, said material consisting essentially of 1,3-bis(3-methacryloxypropyl)tetramethyldisiloxane and an initiator.",
    "8. The method as recited in claim 1 wherein producing further includes disposing, on said stress relief layer, said material consisting essentially of (3-acryloxypropyl)tris(tri-methoxysiloxy)-silane, ethylene dio diacrylate, t-butyl acrylate, and an initiator.",
    "9. The method as recited in claim 1 wherein producing further includes disposing, on said stress relief layer, said material consisting essentially of acrylate terminated poly siloxane, t-butyl acrylate, and an initiator.",
    "10. The method as recited in claim 1 wherein producing further includes disposing, on said stress relief layer, said material consisting essentially of bisphenol A diacrylate, and an initiator.",
    "11. A method of forming an optical coupling device on a substrate, said method including: forming said substrate with a stress relief layer; disposing a material onto said stress relief layer that is polymerizable in response to actinic radiation; forming a plurality of spaced-apart stacks of said material by contacting said material with a template have a stepped-recess formed therein; and solidifying said plurality of spaced-apart stacks of said material into an optically transparent body with a surface having a plurality of steps by subjecting said stacks to actinic radiation.",
    "12. The method as recited in claim 11 wherein disposing said material on said stress relief layer further includes disposing said material on said stress relief layer, being formed from rubbers of a set of rubbers consisting essentially of polysiloxane rubber and fluorosilocane rubber.",
    "13. The method as recited in claim 12 further including fabricating said substrate from optically transparent material.",
    "14. The method as recited in claim 13 wherein disposing further includes disposing said material with an acrylate component selected from a set of acrylates consisting essentially of ethylene dio diacrylate, t-butyl acrylate, bisphenol A diacrylate, acrylate terminated polysiloxane, polydifluoromethylene diacrylate, perfluoropolyether diacrylates and chlorofluorodiacrylates.",
    "15. The method as recited in claim 13 wherein disposing further includes disposing said material with a silylated component selected from a group consisting essentially of (3-acryloxypropyltristrimethylsiloxy) silane.",
    "16. A method of forming an optical coupling device on a substrate, said method including: forming, on said substrate, a stress relief layer formed from rubbers of a set of rubbers consisting essentially of polysiloxane rubber and fluorosilocane rubber; disposing a material, onto said stress relief layer, that is polymerizable in response to actinic radiation; forming a plurality of spaced-apart stacks of said material by contacting said material with a template having a stepped-recess formed therein; and solidifying said plurality of spaced-apart stacks of material into an optically transparent body with a surface having a plurality of steps by subjecting said stacks to actinic radiation.",
    "17. The method as recited in claim 16 wherein disposing further includes depositing said material from a set of materials consisting essentially of ethylene dio diacrylate and an initiator.",
    "18. The method as recited in claim 16 wherein disposing further includes depositing said material from a set of materials consisting essentially of 1,3-bis(3-methacryloxypropyl)tetramethyldisiloxane and an initiator.",
    "19. The method as recited in claim 16 wherein disposing further includes depositing said material from a set of materials consisting essentially of (3-acryloxypropyl)tris(tri-methoxysiloxy)-silane, ethylene dio diacrylate, t-butyl acrylate, and an initiator.",
    "20. The method as recited in claim 16 wherein disposing further includes depositing said material from a set of materials consisting essentially of acrylate terminated poly siloxane, t-butyl acrylate, and an initiator.",
    "21. The method as recited in claim 16 wherein disposing further includes depositing said material from a set of materials consisting essentially of bisphenol A diacrylate, and an initiator."
  ],
  "description_excerpt": "The field of invention relates generally to micro-fabrication of structures. More particularly, the present invention is directed to a functional patterning material suited for use in imprint lithographic processes to form optical components.\n\nOptical communication systems include numerous optical devices, such as planar optical slab waveguides, channel optical waveguides, rib waveguides, optical couplers, optical splitters, optical switches, micro-optical elements and the like. Many of these optical devices are employed using standard photolithographic processes. As a result, many photopolymers have been developed. The photopolymers, such as acrylate materials, are light sensitive to facilitate recordation of a pattern therein. Furthermore, the photopolymers must demonstrate suitable operational and process characteristics. For example, it is desired that the photopolymers have good clarity and low birefringence over a range of temperatures. As a result, the thermal stability of the photopolymers is an important factor and should be such that the probability of color changes in the photopolymers is minimized during prolonged operation. Additionally, the photopolymers should withstand stresses so as not to crack during the baking process or during use. Finally, maximizing the miniaturization of the optical devices is desired. Recent advances in micro-fabrication techniques, have showed promising results in miniaturizing optical devices.\n\nAn exemplary micro-fabrication technique, commonly referred to as imprint lithography, is shown in U.S. Pat. No. 6,334,960 to Willson et al. Willson et al.",
  "cpc": [
    "G03F 7/0002",
    "B29L 2011/0016",
    "B82Y 10/00",
    "B82Y 40/00",
    "G02B 2006/12147",
    "G02B 6/138"
  ],
  "ipc": [
    "G02B 6/138",
    "G03F 7/00"
  ],
  "assignees": [
    "Molecular Imprints Inc"
  ],
  "inventors": [
    "Michael P. C. Watts"
  ],
  "filing_date": "2002-09-05",
  "publication_date": "2005-08-30",
  "grant_date": "2005-08-30",
  "priority_date": "2002-09-05",
  "application_number": "US-23531402-A",
  "family_id": "31990498",
  "cited_by_count": 270,
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}