Patents full text · MLC-0201
CPC subclass G03F
Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
| No. | Publication | Title | Published | Assignee |
|---|---|---|---|---|
| 1 | US2026106122A1 | Dry chamber clean using thermal and plasma processes | 2026-04-16 | |
| 2 | US2026104634A1 | Mask data preparation method, semiconductor chip manufacturing method using the same, and computing device | 2026-04-16 | |
| 3 | US2024057464A1 | Manufacturing equipment for light-emitting device | 2024-02-15 | SEMICONDUCTOR ENERGY LAB |
| 4 | US10683381B2 | Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes | 2020-06-16 | BRIDGESTONE AMERICAS TIRE OPERATIONS LLC |
| 5 | US10290508B1 | Method for forming vertical spacers for spacer-defined patterning | 2019-05-14 | ASM IP HOLDING BV |
| 6 | US2018356739A1 | Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method | 2018-12-13 | NIKON CORP |
| 7 | US9827209B2 | Display system | 2017-11-28 | MICROSOFT TECHNOLOGY LICENSING LLC |
| 8 | US9588443B2 | Object exchange method, exposure method, carrier system, exposure apparatus, and device manufacturing method | 2017-03-07 | NIKON CORP |
| 9 | US9227392B2 | Slip sheet removal | 2016-01-05 | GUTTMANN YOEL |
| 10 | US8748780B2 | Substrate processing apparatus, substrate processing method, and computer-readable storage medium | 2014-06-10 | MORO SHOUKEN |
| 11 | US8614047B2 | Photodecomposable bases and photoresist compositions | 2013-12-24 | AYOTHI RAMAKRISHNAN |
| 12 | US8072578B2 | Position measurement method, position control method, measurement method, loading method, exposure method and exposure apparatus, and device manufacturing method | 2011-12-06 | YASUDA MASAHIKO |
| 13 | US7874261B2 | Stage apparatus and coating treatment device | 2011-01-25 | TOKYO ELECTRON LTD |
| 14 | US7704684B2 | Methods and devices for fabricating three-dimensional nanoscale structures | 2010-04-27 | UNIV ILLINOIS |
| 15 | US7697195B2 | Apparatus for reducing wavefront errors in output beams of acousto-optic devices | 2010-04-13 | ZYGO CORP |
| 16 | US2010045949A1 | Exposure apparatus, maintaining method and device fabricating method | 2010-02-25 | NIKON CORP |
| 17 | US7489389B2 | Stage device with frame-shaped member movable in at least three degrees of freedom within a two-dimensional plane | 2009-02-10 | NIKON CORP |
| 18 | US2006146384A1 | Optical beam transformation system and illumination system comprising an optical beam transformation system | 2006-07-06 | ZEISS CARL SMT AG |
| 19 | US2006134330A1 | Cluster tool architecture for processing a substrate | 2006-06-22 | APPLIED MATERIALS INC |
| 20 | US6936194B2 | Functional patterning material for imprint lithography processes | 2005-08-30 | MOLECULAR IMPRINTS INC |
| 21 | US6924078B2 | Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion | 2005-08-02 | DONGJIN SEMICHEM CO LTD |
| 22 | US6777896B2 | Methods and apparatus for initializing a planar motor | 2004-08-17 | NIKON CORP |
| 23 | US6660700B2 | Formulations including a 1,3-dicarbonyl compound chelating agent and copper corrosion inhibiting agents for stripping residues from semiconductor substrates containing copper structures | 2003-12-09 | ADVANCED TECHNOLOGIES MATERIAL |
| 24 | US6636313B2 | Method of measuring photoresist and bump misalignment | 2003-10-21 | TAIWAN SEMICONDUCTOR MFG |
| 25 | US6623911B1 | Method to form code marks on mask ROM products | 2003-09-23 | TAIWAN SEMICONDUCTOR MFG |
| 26 | US6398874B2 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same | 2002-06-04 | SAMSUNG ELECTRONICS CO LTD |
| 27 | US6189339B1 | Method for producing silica glass used for photolithography | 2001-02-20 | NIKON CORP |
| 28 | US6004724A | Oxime sulfonates and the use thereof as latent sulfonic acids | 1999-12-21 | CIBA SC HOLDING AG |
| 29 | US5760564A | Dual guide beam stage mechanism with yaw control | 1998-06-02 | NIKON PRECISION INC |
| 30 | US5695817A | Method of forming a coating film | 1997-12-09 | TOKYO ELECTRON LTD |
| 31 | US5642956A | Adjustable link for kinematic mounting systems | 1997-07-01 | UNIV CALIFORNIA |
| 32 | US5618932A | Photoactive compounds and compositions | 1997-04-08 | SHIPLEY CO LLC |
| 33 | US5124745A | Apparatus for the production of printing plates | 1992-06-23 | KRAUSE BIAGOSCH GMBH |
| 34 | US4535278A | Two-dimensional precise positioning device for use in a semiconductor manufacturing apparatus | 1985-08-13 | TELMEC CO LTD |
| 35 | US4425076A | Process and apparatus for automatic positioning of a substrate on a worktable | 1984-01-10 | CII HONEYWELL BULL |
35 records in this listing. Patents full text (MLC-0201). Request the full dataset.