Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method

{
  "publication_number": "US9798253B2",
  "country": "US",
  "kind": "B2",
  "title": "Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method",
  "abstract": "A support table having: a base surface configured to be substantially parallel to a lower surface of a substrate, a plurality of burls each having a respective distal end and a first height above the base surface, the burls arranged to support the substrate by the respective distal ends, and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion having a second height above the base surface that is less than the first height. The base surface has a plurality of regions within each of which some of the elongate raised protrusions are located. All of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.",
  "claims": [
    "1. A support table for a lithographic apparatus, the support table configured to support a lower surface of a substrate, wherein the support table comprises: a base surface configured to be substantially parallel to the lower surface of the substrate supported on the support table; a plurality of burls protruding above the base surface, each burl of the plurality of burls having a respective distal end and a first height above the base surface, the plurality of burls arranged such that, when the substrate is supported by the support table, the substrate is supported by the respective distal end of each burl of the plurality of the burls; and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height, wherein the base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located, wherein all of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.",
    "2. The support table of claim 1, wherein at least about 20% of the area of the support table in plan view is formed by the elongate raised protrusions.",
    "3. The support table of claim 1, wherein each elongate raised protrusion of the elongate raised protrusions is arranged to have a zigzag shape or to have a meandering shape so as to be positioned between the burls.",
    "4. The support table of claim 1, wherein the elongate raised protrusions are substantially straight.",
    "5. The support table of claim 1, wherein, for each elongate raised protrusion of the elongate raised protrusions, an angle defined between an axis of elongation of the elongate raised protrusion and a radius of the base surface that passes through a center of the elongate raised protrusion is no more than about 25°, and/or wherein each elongate raised protrusion of the elongate raised protrusions has a length at least ten times a mean pitch between the burls.",
    "6. The support table of claim 1, wherein the support table comprises a plurality of holes formed therein spaced apart a distance from a center of the base surface, wherein an outer set of the elongate raised protrusions are positioned in an outer region radially outward of the holes and an inner set of the elongate raised protrusions are positioned in an inner region radially inward of the holes, so as to form an azimuthal gas flow path at the distance from the center of the base surface.",
    "7. The support table of claim 1, wherein the at least one gas flow path is substantially radial with respect to a center of the base surface.",
    "8. The support table of claim 1, wherein a floor of the at least one gas flow path is lower than the base surface such that the at least one gas flow path includes a groove in the base surface.",
    "9. The support table of claim 1, wherein the second height is at least 90% of the first height.",
    "10. The support table of claim 1, wherein one or more of the burls has a stepped profile in cross-section in a plane perpendicular to the base surface, wherein the stepped profile has a first portion that has the first height and a respective distal end so as to support the lower surface of the substrate, and a second portion that surrounds the first portion and protrudes from a floor of the at least one gas flow path, the second portion having a third height above the base surface less than the first height.",
    "11. The support table of claim 1, further comprising a conditioning system configured to supply heat to and/or remove heat from the support table, and/or wherein the elongate raised protrusions are configured to increase thermal conductivity between the support table and the substrate.",
    "12. The support table of claim 1, wherein each elongate raised protrusion of the elongate raised protrusions has a direction of elongation that comprises a radial component and a tangential component, wherein a magnitude of the radial component is greater than a magnitude of the tangential component.",
    "13. The support table of claim 1, wherein the elongate raised protrusions located within each region have directions of elongation that deviate by no more than 10° from each other.",
    "14. A lithographic apparatus, comprising the support table of claim 1.",
    "15. A device manufacturing method, comprising using a lithographic apparatus to transfer a pattern from a patterning device to a substrate, wherein the lithographic apparatus comprises a support table supporting the substrate, the support table comprising: a base surface configured to be substantially parallel to the lower surface of the substrate supported on the support table; a plurality of burls protruding above the base surface, each burl of the plurality of burls having a respective distal end and a first height above the base surface, the substrate supported by the respective distal end of each burl of the plurality of the burls; and a plurality of elongate raised protrusions protruding above the base surface, each elongate raised protrusion of the elongate raised protrusions having a second height above the base surface, wherein the second height is less than the first height, wherein the base surface comprises a plurality of regions within each of which some of the elongate raised protrusions are located, wherein all of the elongate raised protrusions located within each region have substantially the same direction of elongation such that they are substantially parallel to each other so as to form between the elongate raised protrusions at least one gas flow path substantially parallel to the elongate raised protrusions.",
    "16. The method of claim 15, wherein at least about 20% of the area of the support table in plan view is formed by the elongate raised protrusions.",
    "17. The method of claim 15, wherein each elongate raised protrusion of the elongate raised protrusions is arranged to have a zig-zag shape or to have a meandering shape so as to be positioned between the burls.",
    "18. The method of claim 15, wherein the elongate raised protrusions are substantially straight.",
    "19. The method of claim 15, wherein, for each elongate raised protrusion of the elongate raised protrusions, an angle defined between an axis of elongation of the elongate raised protrusion and a radius of the base surface that passes through a center of the elongate raised protrusion is no more than about 25°, and/or wherein each elongate raised protrusion of the elongate raised protrusions has a length at least ten times a mean pitch between the burls.",
    "20. The method of claim 15, wherein the support table comprises a plurality of holes formed therein spaced apart a distance from a center of the base surface, wherein an outer set of the elongate raised protrusions are positioned in an outer region radially outward of the holes and an inner set of the elongate raised protrusions are positioned in an inner region radially inward of the holes, so as to form an azimuthal gas flow path at the distance from the center of the base surface."
  ],
  "description_excerpt": "The present invention relates to a support table for a lithographic apparatus, a lithographic apparatus and a method for manufacturing a device using a lithographic apparatus.\n\nA lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). In that instance, a patterning device, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern to be formed on an individual layer of the IC. This pattern can be transferred onto a target portion (e.g. comprising part of, one, or several dies) on a substrate (e.g. a silicon wafer). Transfer of the pattern is typically via imaging onto a layer of radiation-sensitive material (resist) provided on the substrate. In general, a single substrate will contain a network of adjacent target portions that are successively patterned. Known lithographic apparatus include so-called steppers, in which each target portion is irradiated by exposing an entire pattern onto the target portion at one time, and so-called scanners, in which each target portion is irradiated by scanning the pattern through a radiation beam in a given direction (the “scanning”-direction) while synchronously scanning the substrate parallel or anti-parallel to this direction. It is also possible to transfer the pattern from the patterning device to the substrate by imprinting the pattern onto the substrate.",
  "cpc": [
    "G03F 7/70875",
    "G03F 7/70341",
    "G03F 7/707",
    "G03F 7/70716",
    "G03F 7/70866",
    "H01L 21/67028",
    "H01L 21/67051",
    "H01L 21/6875",
    "H10P 72/0406",
    "H10P 72/0414",
    "H10P 72/7614"
  ],
  "ipc": [
    "G03F 7/20",
    "H01L 21/67",
    "H01L 21/687"
  ],
  "assignees": [
    "ASML Netherlands BV"
  ],
  "inventors": [
    "Daan Daniel Johannes Antonius VAN SOMMEREN",
    "Thomas POIESZ"
  ],
  "filing_date": "2015-03-25",
  "publication_date": "2017-10-24",
  "grant_date": "2017-10-24",
  "priority_date": "2014-04-30",
  "application_number": "US-201515306676-A",
  "family_id": "50677962",
  "cited_by_count": 6,
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}