MLchartDataset catalogue

Patent · US9508667B2 · B2 · US

Formation of solder and copper interconnect structures and associated techniques and configurations

(11) Publication number
US9508667B2
(21) Application number
14/581,825
(22) Filing date
2014-12-23
(30) Priority date
2014-12-23
(43) Publication date
2016-11-29
(45) Date of grant
2016-11-29
(52) CPC
  • H10W Generic packages, interconnections, connectors or other constructional details of devices covered by class H10: 90/701, 20/01, 20/063, 20/4421, 20/4473, 70/098, 72/01223, 72/01225, 72/01236, 72/01257, 72/01261, 72/0198, 72/072, 72/073, 72/252, 72/29, 74/15, 90/724, 90/734, 90/754
  • H01L Electric elements: 21/768, 2224/11318, 2224/1132, 2224/11332, 2224/11505, 2224/11849, 2224/13147, 23/53228, 24/11, 2924/14
  • H10P Generic processes or apparatus for the manufacture or treatment of devices covered by class H10: 14/46
(73) Assignee
INTEL CORP
(54) Title
Formation of solder and copper interconnect structures and associated techniques and configurations
(57) Abstract

Embodiments of the present disclosure are directed toward formation of solder and copper interconnect structures and associated techniques and configurations. In one embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a solderable material on the IC substrate using an ink deposition process, a binder printing system, or a powder laser sintering system. In another embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a copper powder on the IC substrate using an additive process to form a copper interconnect structure. Other embodiments may be described and/or claimed.

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Claims (4)

  1. A method comprising: providing an integrated circuit (IC) substrate; depositing a solderable ink on the IC substrate using an ink deposition process, wherein the solderable ink includes a solder powder mixed with a no residue flux (NRF) material that includes a base polymer of polyarylene carbonate (PAC) material and a formic acid fluxing agent; and reflowing the deposited solderable ink to form one or more solder bumps on the IC substrate, wherein a first solder bump of the one or more solder bumps has a size that is different than a size of a second solder bump of the one or more solder bumps.
  2. The method of claim 1, wherein the solderable ink includes a solder powder mixed with a stabilizing binder that is stable at room temperature and configured to decompose at an elevated temperature above the room temperature.
  3. The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an ink jet printer according to a computer-aided design (CAD) file.
  4. The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an aerosol jet printing system according to a computer-aided design (CAD) file.

Citations (6)

  • US2006163744A1
  • US2007062723A1
  • US2012309866A1
  • US2014035995A1
  • US6724912B1
  • US7564130B1
Record as JSON
{
  "publication_number": "US9508667B2",
  "country": "US",
  "kind": "B2",
  "title": "Formation of solder and copper interconnect structures and associated techniques and configurations",
  "abstract": "Embodiments of the present disclosure are directed toward formation of solder and copper interconnect structures and associated techniques and configurations. In one embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a solderable material on the IC substrate using an ink deposition process, a binder printing system, or a powder laser sintering system. In another embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a copper powder on the IC substrate using an additive process to form a copper interconnect structure. Other embodiments may be described and/or claimed.",
  "claims": [
    "1. A method comprising: providing an integrated circuit (IC) substrate; depositing a solderable ink on the IC substrate using an ink deposition process, wherein the solderable ink includes a solder powder mixed with a no residue flux (NRF) material that includes a base polymer of polyarylene carbonate (PAC) material and a formic acid fluxing agent; and reflowing the deposited solderable ink to form one or more solder bumps on the IC substrate, wherein a first solder bump of the one or more solder bumps has a size that is different than a size of a second solder bump of the one or more solder bumps.",
    "2. The method of claim 1, wherein the solderable ink includes a solder powder mixed with a stabilizing binder that is stable at room temperature and configured to decompose at an elevated temperature above the room temperature.",
    "3. The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an ink jet printer according to a computer-aided design (CAD) file.",
    "4. The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an aerosol jet printing system according to a computer-aided design (CAD) file."
  ],
  "cpc": [
    "H10W 90/701",
    "H01L 21/768",
    "H01L 2224/11318",
    "H01L 2224/1132",
    "H01L 2224/11332",
    "H01L 2224/11505",
    "H01L 2224/11849",
    "H01L 2224/13147",
    "H01L 23/53228",
    "H01L 24/11",
    "H01L 2924/14",
    "H10P 14/46",
    "H10W 20/01",
    "H10W 20/063",
    "H10W 20/4421",
    "H10W 20/4473",
    "H10W 70/098",
    "H10W 72/01223",
    "H10W 72/01225",
    "H10W 72/01236",
    "H10W 72/01257",
    "H10W 72/01261",
    "H10W 72/0198",
    "H10W 72/072",
    "H10W 72/073",
    "H10W 72/252",
    "H10W 72/29",
    "H10W 74/15",
    "H10W 90/724",
    "H10W 90/734",
    "H10W 90/754"
  ],
  "assignees": [
    "INTEL CORP"
  ],
  "filing_date": "2014-12-23",
  "publication_date": "2016-11-29",
  "grant_date": "2016-11-29",
  "priority_date": "2014-12-23",
  "application_number": "US-201414581825-A",
  "family_id": "56130334",
  "citations": [
    "US2006163744A1",
    "US2007062723A1",
    "US2012309866A1",
    "US2014035995A1",
    "US6724912B1",
    "US7564130B1"
  ]
}

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