Patent · US9508667B2 · B2 · US
Formation of solder and copper interconnect structures and associated techniques and configurations
- (11) Publication number
- US9508667B2
- (21) Application number
- 14/581,825
- (22) Filing date
- 2014-12-23
- (30) Priority date
- 2014-12-23
- (43) Publication date
- 2016-11-29
- (45) Date of grant
- 2016-11-29
- (52) CPC
- H10W Generic packages, interconnections, connectors or other constructional details of devices covered by class H10: 90/701, 20/01, 20/063, 20/4421, 20/4473, 70/098, 72/01223, 72/01225, 72/01236, 72/01257, 72/01261, 72/0198, 72/072, 72/073, 72/252, 72/29, 74/15, 90/724, 90/734, 90/754
- H01L Electric elements: 21/768, 2224/11318, 2224/1132, 2224/11332, 2224/11505, 2224/11849, 2224/13147, 23/53228, 24/11, 2924/14
- H10P Generic processes or apparatus for the manufacture or treatment of devices covered by class H10: 14/46
- (73) Assignee
- INTEL CORP
- (54) Title
- Formation of solder and copper interconnect structures and associated techniques and configurations
- (57) Abstract
Embodiments of the present disclosure are directed toward formation of solder and copper interconnect structures and associated techniques and configurations. In one embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a solderable material on the IC substrate using an ink deposition process, a binder printing system, or a powder laser sintering system. In another embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a copper powder on the IC substrate using an additive process to form a copper interconnect structure. Other embodiments may be described and/or claimed.
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Claims (4)
- A method comprising: providing an integrated circuit (IC) substrate; depositing a solderable ink on the IC substrate using an ink deposition process, wherein the solderable ink includes a solder powder mixed with a no residue flux (NRF) material that includes a base polymer of polyarylene carbonate (PAC) material and a formic acid fluxing agent; and reflowing the deposited solderable ink to form one or more solder bumps on the IC substrate, wherein a first solder bump of the one or more solder bumps has a size that is different than a size of a second solder bump of the one or more solder bumps.
- The method of claim 1, wherein the solderable ink includes a solder powder mixed with a stabilizing binder that is stable at room temperature and configured to decompose at an elevated temperature above the room temperature.
- The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an ink jet printer according to a computer-aided design (CAD) file.
- The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an aerosol jet printing system according to a computer-aided design (CAD) file.
Citations (6)
- US2006163744A1
- US2007062723A1
- US2012309866A1
- US2014035995A1
- US6724912B1
- US7564130B1
Record as JSON
{
"publication_number": "US9508667B2",
"country": "US",
"kind": "B2",
"title": "Formation of solder and copper interconnect structures and associated techniques and configurations",
"abstract": "Embodiments of the present disclosure are directed toward formation of solder and copper interconnect structures and associated techniques and configurations. In one embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a solderable material on the IC substrate using an ink deposition process, a binder printing system, or a powder laser sintering system. In another embodiment, a method includes providing an integrated circuit (IC) substrate and depositing a copper powder on the IC substrate using an additive process to form a copper interconnect structure. Other embodiments may be described and/or claimed.",
"claims": [
"1. A method comprising: providing an integrated circuit (IC) substrate; depositing a solderable ink on the IC substrate using an ink deposition process, wherein the solderable ink includes a solder powder mixed with a no residue flux (NRF) material that includes a base polymer of polyarylene carbonate (PAC) material and a formic acid fluxing agent; and reflowing the deposited solderable ink to form one or more solder bumps on the IC substrate, wherein a first solder bump of the one or more solder bumps has a size that is different than a size of a second solder bump of the one or more solder bumps.",
"2. The method of claim 1, wherein the solderable ink includes a solder powder mixed with a stabilizing binder that is stable at room temperature and configured to decompose at an elevated temperature above the room temperature.",
"3. The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an ink jet printer according to a computer-aided design (CAD) file.",
"4. The method of claim 1, wherein: the IC substrate includes a contact; providing the IC substrate comprises providing a die, wafer, or package substrate; and depositing the solderable ink comprises depositing a solderable material on the contact using an aerosol jet printing system according to a computer-aided design (CAD) file."
],
"cpc": [
"H10W 90/701",
"H01L 21/768",
"H01L 2224/11318",
"H01L 2224/1132",
"H01L 2224/11332",
"H01L 2224/11505",
"H01L 2224/11849",
"H01L 2224/13147",
"H01L 23/53228",
"H01L 24/11",
"H01L 2924/14",
"H10P 14/46",
"H10W 20/01",
"H10W 20/063",
"H10W 20/4421",
"H10W 20/4473",
"H10W 70/098",
"H10W 72/01223",
"H10W 72/01225",
"H10W 72/01236",
"H10W 72/01257",
"H10W 72/01261",
"H10W 72/0198",
"H10W 72/072",
"H10W 72/073",
"H10W 72/252",
"H10W 72/29",
"H10W 74/15",
"H10W 90/724",
"H10W 90/734",
"H10W 90/754"
],
"assignees": [
"INTEL CORP"
],
"filing_date": "2014-12-23",
"publication_date": "2016-11-29",
"grant_date": "2016-11-29",
"priority_date": "2014-12-23",
"application_number": "US-201414581825-A",
"family_id": "56130334",
"citations": [
"US2006163744A1",
"US2007062723A1",
"US2012309866A1",
"US2014035995A1",
"US6724912B1",
"US7564130B1"
]
}
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