MLchartDataset catalogue

Patent · US9517929B2 · B2 · US

Method of fabricating electromechanical microchips with a burst ultrafast laser pulses

(11) Publication number
US9517929B2
(21) Application number
14/539,861
(22) Filing date
2014-11-12
(30) Priority date
2013-11-19
(43) Publication date
2016-12-13
(45) Date of grant
2016-12-13
(52) CPC
  • B81C Processes or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems: 1/00238, 1/00, 1/00634, 2201/019, 2203/036, 2203/038, 3/00
  • B23K Soldering or unsoldering; welding; cladding or plating by soldering or welding; cutting by applying heat locally, e.g. flame cutting; working by laser beam: 2103/50, 2203/50, 26/0069, 26/0604, 26/0624, 26/0626, 26/0648, 26/356, 26/382, 26/40
  • C03B Manufacture, shaping, or supplementary processes: 33/0222, 33/04
  • H01L Electric elements: 25/043, 25/0657, 25/0756, 25/117
  • H10W Generic packages, interconnections, connectors or other constructional details of devices covered by class H10: 90/00
(73) Assignee
ROFIN-SINAR TECH INC
(54) Title
Method of fabricating electromechanical microchips with a burst ultrafast laser pulses
(57) Abstract

A method for making an electromechanical chip using a plurality of transparent substrates, comprising the steps of: machining, using photoacoustic compression, full or partial voids in at least one of the plurality of substrates. The plurality of transparent substrates are stacked and arranged in a specific order. The transparent substrates are affixed and sealed together. The chip may be sealed by laser welding or adhesive.

Full text
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Claims (11)

  1. A method for making an electromechanical chip using a first transparent substrate and a second transparent substrate, comprising the steps of: machining full or partial voids on said first transparent substrate using photoacoustic compression; and, affixing said first transparent substrate and said second transparent substrate together.
  2. A method for making an electromechanical chip using a first transparent substrate and a second transparent substrate, comprising the steps of: machining full or partial voids in said first transparent substrate using photoacoustic compression; machining full or partial voids in said second transparent substrate using photoacoustic compression; placing said first and second transparent substrates in engagement with one another such that said full or partial voids of said first transparent substrate communicate with said full or partial voids of said second transparent substrate.
  3. A method for making an electromechanical chip using a plurality of transparent substrates, comprising the steps of: machining, using photoacoustic compression, full or partial voids in at least one of said plurality of substrates; stacking said plurality of transparent substrates in a specific order; affixing said substrates together.
  4. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, comprising the steps of: sealing said chip by laser welding said transparent substrates together.
  5. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, wherein said plurality of transparent substrates include varying thicknesses.
  6. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, wherein said step of stacking said plurality of transparent substrates includes aligning said full or partial voids in at least two said transparent substrates.
  7. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, further comprising the steps of: injecting a gas, liquid or solid into one of said full or partial voids in said at least one of said plurality of substrates, and then sealing said plurality of substrates together.
  8. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 7, wherein said step of sealing is performed with a laser.
  9. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 7, wherein said step of sealing is performed with an adhesive.
  10. A method for making an electromechanical chip using a plurality of transparent substrates, comprising the steps of: machining, using photoacoustic compression, full or partial voids in at least two of said plurality of substrates; stacking said plurality of machined transparent substrates in a specific order and formatting said electromechanical chip as a device selected from the group of electrodes, wires, electrical and mechanical conduits, electrical and mechanical sensors, transistors, TTL circuits, logic circuits, capacitors, diodes, Zener diodes, Schottky diodes, linear and switching power supplies, power supply circuits including bridge circuits, chemical and biological analytic circuits, microfluidic channels, microfluidic controls and other microelectronics; and, affixing said substrates together.
  11. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 10, further comprising: said step of affixing said substrates together is performed with a laser.

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Record as JSON
{
  "publication_number": "US9517929B2",
  "country": "US",
  "kind": "B2",
  "title": "Method of fabricating electromechanical microchips with a burst ultrafast laser pulses",
  "abstract": "A method for making an electromechanical chip using a plurality of transparent substrates, comprising the steps of: machining, using photoacoustic compression, full or partial voids in at least one of the plurality of substrates. The plurality of transparent substrates are stacked and arranged in a specific order. The transparent substrates are affixed and sealed together. The chip may be sealed by laser welding or adhesive.",
  "claims": [
    "1. A method for making an electromechanical chip using a first transparent substrate and a second transparent substrate, comprising the steps of: machining full or partial voids on said first transparent substrate using photoacoustic compression; and, affixing said first transparent substrate and said second transparent substrate together.",
    "2. A method for making an electromechanical chip using a first transparent substrate and a second transparent substrate, comprising the steps of: machining full or partial voids in said first transparent substrate using photoacoustic compression; machining full or partial voids in said second transparent substrate using photoacoustic compression; placing said first and second transparent substrates in engagement with one another such that said full or partial voids of said first transparent substrate communicate with said full or partial voids of said second transparent substrate.",
    "3. A method for making an electromechanical chip using a plurality of transparent substrates, comprising the steps of: machining, using photoacoustic compression, full or partial voids in at least one of said plurality of substrates; stacking said plurality of transparent substrates in a specific order; affixing said substrates together.",
    "4. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, comprising the steps of: sealing said chip by laser welding said transparent substrates together.",
    "5. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, wherein said plurality of transparent substrates include varying thicknesses.",
    "6. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, wherein said step of stacking said plurality of transparent substrates includes aligning said full or partial voids in at least two said transparent substrates.",
    "7. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 3, further comprising the steps of: injecting a gas, liquid or solid into one of said full or partial voids in said at least one of said plurality of substrates, and then sealing said plurality of substrates together.",
    "8. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 7, wherein said step of sealing is performed with a laser.",
    "9. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 7, wherein said step of sealing is performed with an adhesive.",
    "10. A method for making an electromechanical chip using a plurality of transparent substrates, comprising the steps of: machining, using photoacoustic compression, full or partial voids in at least two of said plurality of substrates; stacking said plurality of machined transparent substrates in a specific order and formatting said electromechanical chip as a device selected from the group of electrodes, wires, electrical and mechanical conduits, electrical and mechanical sensors, transistors, TTL circuits, logic circuits, capacitors, diodes, Zener diodes, Schottky diodes, linear and switching power supplies, power supply circuits including bridge circuits, chemical and biological analytic circuits, microfluidic channels, microfluidic controls and other microelectronics; and, affixing said substrates together.",
    "11. A method for making an electromechanical chip using a plurality of transparent substrates as claimed in claim 10, further comprising: said step of affixing said substrates together is performed with a laser."
  ],
  "cpc": [
    "B81C 1/00238",
    "B23K 2103/50",
    "B23K 2203/50",
    "B23K 26/0069",
    "B23K 26/0604",
    "B23K 26/0624",
    "B23K 26/0626",
    "B23K 26/0648",
    "B23K 26/356",
    "B23K 26/382",
    "B23K 26/40",
    "B81C 1/00",
    "B81C 1/00634",
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    "B81C 3/00",
    "C03B 33/0222",
    "C03B 33/04",
    "H01L 25/043",
    "H01L 25/0657",
    "H01L 25/0756",
    "H01L 25/117",
    "H10W 90/00"
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  "assignees": [
    "ROFIN-SINAR TECH INC"
  ],
  "filing_date": "2014-11-12",
  "publication_date": "2016-12-13",
  "grant_date": "2016-12-13",
  "priority_date": "2013-11-19",
  "application_number": "US-201414539861-A",
  "family_id": "51951657",
  "citations": [
    "CA2332154A1",
    "CA2907757A1",
    "CN102785031A",
    "EP2754524A1",
    "EP2781296A1",
    "EP2868421A1",
    "EP2898982A2",
    "JP2006305803A",
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    "JP4692717B2",
    "JP5089735B2",
    "JP5271092B2",
    "US2002125232A1",
    "US2002195433A1",
    "US2003006221A1",
    "US2003072890A1",
    "US2004017428A1",
    "US2004248503A1",
    "US2005006361A1",
    "US2005186760A1",
    "US2005269301A1",
    "US2006099810A1",
    "US2006108339A1",
    "US2006207976A1",
    "US2007051706A1",
    "US2007298529A1",
    "US2009294422A1",
    "US2010025387A1",
    "US2010084384A1",
    "US2010279067A1",
    "US2011259631A1",
    "US2012234807A1",
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    "US2013293482A1",
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    "US2014213040A1",
    "US2014340730A1",
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    "US2015367442A1",
    "US2016009586A1",
    "US2016031745A1",
    "US2016059359A1",
    "US2016060156A1",
    "US5107510A",
    "US5567336A",
    "US5609284A",
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    "US6333485B1",
    "US6407360B1",
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  ]
}

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