MLchartDataset catalogue

Etch rate

Term · Chemistry · MLC-T-CHM-004115

The speed at which material is removed from a substrate surface during an etching process. This rate is typically measured in units of nanometers per minute or angstroms per minute. It is influenced by factors such as etchant concentration, temperature, and the specific material being etched.

Table 1. Record
IdentifierMLC-T-CHM-004115
FieldChemistry
SubjectPolymer
ReferencesPAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1874 (https://doi.org/10.1515/pac-2018-1215)
Record as JSON
{
  "id": "MLC-T-CHM-004115",
  "term": "Etch rate",
  "field": "Chemistry",
  "definition": "The speed at which material is removed from a substrate surface during an etching process. This rate is typically measured in units of nanometers per minute or angstroms per minute. It is influenced by factors such as etchant concentration, temperature, and the specific material being etched.",
  "subject": "Polymer",
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1874 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/etch-rate/"
}

Record 4,358 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.