Plasma etch

{
  "id": "MLC-T-CHM-009010",
  "term": "Plasma etch",
  "field": "Chemistry",
  "definition": "A dry etching process that uses a plasma, typically generated from a gas mixture, to selectively remove material from a substrate. Reactive species within the plasma chemically react with the material, forming volatile products that are then pumped away. This technique offers anisotropic etching profiles and is widely used in microfabrication for patterning thin films.",
  "subject": "Polymer",
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1884 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/plasma-etch/"
}