Dry-etch resistance

{
  "id": "MLC-T-CHM-003461",
  "term": "Dry-etch resistance",
  "field": "Chemistry",
  "definition": "The ability of a polymer resist material to withstand erosion during a dry-etching process, which uses reactive gases or plasma to remove substrate material. A resist with high dry-etch resistance maintains its structural integrity and pattern fidelity while the underlying substrate is being patterned. This property is quantified by the etch selectivity, the ratio of the substrate's etch rate to the resist's etch rate.",
  "synonyms": [
    "etch resistance"
  ],
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1873 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/dry-etch-resistance/"
}