Lift-off process

{
  "id": "MLC-T-CHM-006565",
  "term": "Lift-off process",
  "field": "Chemistry",
  "definition": "A microfabrication technique used to create patterns of thin films on a substrate by depositing the film over a patterned resist layer and then removing the resist. The resist is typically patterned using photolithography, and its removal, along with the unwanted overlying film, leaves behind the desired material pattern. This method is particularly effective for materials that are difficult to etch directly.",
  "subject": "Polymer",
  "see_also": [
    "dry etching",
    "etch",
    "resist strip",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1876 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/lift-off-process/"
}