Dry etching
Term · Chemistry · MLC-T-CHM-003460
A process that removes material from a substrate using reactive gases or plasma, rather than liquid chemicals. The gaseous species react with the substrate material to form volatile products, which are then pumped away. This technique offers anisotropic etching profiles and is widely used in semiconductor manufacturing.
| Identifier | MLC-T-CHM-003460 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1874 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Mask |
Record as JSON
{
"id": "MLC-T-CHM-003460",
"term": "Dry etching",
"field": "Chemistry",
"definition": "A process that removes material from a substrate using reactive gases or plasma, rather than liquid chemicals. The gaseous species react with the substrate material to form volatile products, which are then pumped away. This technique offers anisotropic etching profiles and is widely used in semiconductor manufacturing.",
"subject": "Polymer",
"see_also": [
"mask"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1874 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/dry-etching/"
}
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