Mask
Term · Chemistry · MLC-T-CHM-006965
A patterned layer used in lithography to selectively block or transmit radiation, thereby transferring a design onto a substrate coated with a photosensitive material. It acts as a stencil, defining the areas of the substrate that will be exposed to light or other forms of radiation. Masks are typically fabricated from materials like quartz or glass with opaque patterns of chromium or other metals.
| Identifier | MLC-T-CHM-006965 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| Synonyms | photomask |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1879 (https://doi.org/10.1515/pac-2018-1215) |
| See also | X-ray lithography; Direct-write lithography; Image |
Record as JSON
{
"id": "MLC-T-CHM-006965",
"term": "Mask",
"field": "Chemistry",
"definition": "A patterned layer used in lithography to selectively block or transmit radiation, thereby transferring a design onto a substrate coated with a photosensitive material. It acts as a stencil, defining the areas of the substrate that will be exposed to light or other forms of radiation. Masks are typically fabricated from materials like quartz or glass with opaque patterns of chromium or other metals.",
"synonyms": [
"photomask"
],
"subject": "Polymer",
"see_also": [
"X-ray lithography",
"direct-write lithography",
"image"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1879 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/mask/"
}
Record 7,377 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.