Electron beam lithography

{
  "id": "MLC-T-CHM-003709",
  "term": "Electron beam lithography",
  "field": "Chemistry",
  "definition": "A lithographic technique that uses a focused beam of electrons to draw patterns directly onto a surface coated with a resist. The electron beam induces chemical changes in the resist, altering its solubility and allowing for the selective removal of either the exposed or unexposed regions. This direct-write method contrasts with photolithography, which uses a mask and light, and achieves resolutions below 10 nanometers.",
  "synonyms": [
    "e-beam lithography"
  ],
  "subject": "Polymer",
  "see_also": [
    "lithography",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/electron-beam-lithography/"
}