Electron-beam direct-write lithography

{
  "id": "MLC-T-CHM-003743",
  "term": "Electron-beam direct-write lithography",
  "field": "Chemistry",
  "definition": "A maskless lithography technique where a focused electron beam directly patterns a resist-coated substrate according to a digital design, without the need for a physical mask. This method offers high resolution and flexibility for prototyping and low-volume production of micro- and nanoscale devices. It is a variant of electron beam lithography, distinguished by its direct patterning capability.",
  "subject": "Polymer",
  "see_also": [
    "electron beam lithography",
    "mask"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/electron-beam-direct-write-lithography/"
}