Interference lithography
Term · Chemistry · MLC-T-CHM-005944
A patterning technique that uses the interference patterns of two or more coherent light beams to create periodic structures in a photosensitive polymer film. This method allows for the fabrication of high-resolution, large-area patterns without the need for a physical mask. It is widely used in the production of photonic crystals and gratings.
| Identifier | MLC-T-CHM-005944 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| Synonyms | holographic lithography |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Mask |
Record as JSON
{
"id": "MLC-T-CHM-005944",
"term": "Interference lithography",
"field": "Chemistry",
"definition": "A patterning technique that uses the interference patterns of two or more coherent light beams to create periodic structures in a photosensitive polymer film. This method allows for the fabrication of high-resolution, large-area patterns without the need for a physical mask. It is widely used in the production of photonic crystals and gratings.",
"synonyms": [
"holographic lithography"
],
"subject": "Polymer",
"see_also": [
"mask"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/interference-lithography/"
}
Record 6,308 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.