Maskless lithography

{
  "id": "MLC-T-CHM-006967",
  "term": "Maskless lithography",
  "field": "Chemistry",
  "definition": "A lithographic technique that creates patterns on a substrate without the use of a physical mask. Instead, the pattern is generated directly by a computer-controlled beam, such as an electron beam or laser. This method offers flexibility for rapid prototyping and custom pattern generation, avoiding the cost and time associated with mask fabrication.",
  "subject": "Polymer",
  "see_also": [
    "lithography",
    "direct-write lithography",
    "image",
    "mask"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1877 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/maskless-lithography/"
}