Mask error enhancement factor

{
  "id": "MLC-T-CHM-006966",
  "term": "Mask error enhancement factor",
  "field": "Chemistry",
  "definition": "A metric quantifying how effectively imperfections or variations in the lithographic mask pattern are transferred and amplified in the final resist image on the wafer. A higher factor indicates that small errors on the mask result in larger, more pronounced errors in the printed feature. This factor is particularly relevant for sub-wavelength lithography processes.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1879 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/mask-error-enhancement-factor/"
}