Resist

{
  "id": "MLC-T-CHM-010230",
  "term": "Resist",
  "field": "Chemistry",
  "definition": "A radiation-sensitive polymeric material applied as a thin film to a substrate to enable pattern transfer during a lithographic process. Exposure to a patterned beam of radiation, such as light or electrons, induces chemical changes that alter the solubility of the exposed regions in a specific developer solvent. A positive resist becomes more soluble upon exposure, whereas a negative resist becomes less soluble.",
  "subject": "Polymer",
  "see_also": [
    "development",
    "image",
    "mask"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/resist/"
}