Electron beam resist

{
  "id": "MLC-T-CHM-003710",
  "term": "Electron beam resist",
  "field": "Chemistry",
  "definition": "A radiation-sensitive polymer material formulated to undergo chemical changes upon exposure to a focused beam of high-energy electrons. In a positive resist, exposure breaks polymer chains, increasing solubility; in a negative resist, exposure causes cross-linking, decreasing solubility. Common examples of electron beam resists include poly(methyl methacrylate), or PMMA, for positive-tone applications and chemically amplified resists for negative-tone processes.",
  "synonyms": [
    "e-beam resist",
    "electron-beam resist"
  ],
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/electron-beam-resist/"
}