Chemically amplified resist

{
  "id": "MLC-T-CHM-001973",
  "term": "Chemically amplified resist",
  "field": "Chemistry",
  "definition": "A type of photoresist material where a catalytic reaction, initiated by exposure to radiation, modifies the solubility of the polymer. This chemical amplification allows for high sensitivity to radiation, enabling the use of lower exposure doses. The process typically involves a photoacid generator that produces acid upon irradiation, which then catalyzes deprotection reactions within the polymer matrix.",
  "subject": "Polymer",
  "see_also": [
    "resist",
    "deprotection",
    "photoacid generator"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/chemically-amplified-resist/"
}