Dissolution inhibitor
Term · Chemistry · MLC-T-CHM-003328
A compound added to a polymer resist formulation that reduces the dissolution rate of the unexposed polymer film in a developer solution. In chemically amplified positive-tone photoresists, the inhibitor is converted into a dissolution-promoting substance upon exposure to radiation and subsequent heating, creating a solubility differential. Diazonaphthoquinone (DNQ) is a classic dissolution inhibitor used in g-line and i-line photoresists, where it undergoes a Wolff rearrangement to form a carboxylic acid.
| Identifier | MLC-T-CHM-003328 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1871 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Lithography; Resist |
Record as JSON
{
"id": "MLC-T-CHM-003328",
"term": "Dissolution inhibitor",
"field": "Chemistry",
"definition": "A compound added to a polymer resist formulation that reduces the dissolution rate of the unexposed polymer film in a developer solution. In chemically amplified positive-tone photoresists, the inhibitor is converted into a dissolution-promoting substance upon exposure to radiation and subsequent heating, creating a solubility differential. Diazonaphthoquinone (DNQ) is a classic dissolution inhibitor used in g-line and i-line photoresists, where it undergoes a Wolff rearrangement to form a carboxylic acid.",
"subject": "Polymer",
"see_also": [
"lithography",
"resist"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1871 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/dissolution-inhibitor/"
}
Record 3,539 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.