Multi-component resist

{
  "id": "MLC-T-CHM-007628",
  "term": "Multi-component resist",
  "field": "Chemistry",
  "definition": "A photoresist system composed of at least two distinct chemical components that interact to achieve the desired lithographic patterning. These components typically include a polymer binder, a photoactive compound, and a dissolution inhibitor. The interaction between these components dictates the solubility change upon exposure to radiation, with common examples being chemically amplified resists.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/multi-component-resist/"
}