X-ray resist

{
  "id": "MLC-T-CHM-012768",
  "term": "X-ray resist",
  "field": "Chemistry",
  "definition": "A radiation-sensitive polymer material designed to undergo a chemical change upon exposure to X-rays, enabling pattern transfer in lithographic processes. This material forms a soluble or insoluble region after exposure, which can then be selectively removed by a developer solution. X-ray resists are employed in high-resolution patterning for microelectronics and nanotechnology applications.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1887 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/x-ray-resist/"
}