Dual-tone resist

{
  "id": "MLC-T-CHM-003471",
  "term": "Dual-tone resist",
  "field": "Chemistry",
  "definition": "A photoresist material that can function as either a positive-tone or negative-tone resist depending on the processing conditions, such as the type of developer used or the exposure dose. This versatility allows for greater flexibility in lithographic patterning. Such resists often contain components that undergo different chemical changes upon exposure.",
  "subject": "Polymer",
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1873 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/dual-tone-resist/"
}