Image

{
  "id": "MLC-T-CHM-005589",
  "term": "Image",
  "field": "Chemistry",
  "definition": "A pattern in a resist material created by a spatially selective chemical or physical change induced by exposure to radiation. This latent image is then made visible through a development process that selectively removes either the exposed (positive tone) or unexposed (negative tone) regions of the resist. The final physical relief pattern is a three-dimensional representation of the intended design, ready for subsequent etching or deposition steps.",
  "subject": "Polymer",
  "see_also": [
    "development",
    "embossing"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1875 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/image/"
}