Positive-tone development

{
  "id": "MLC-T-CHM-009294",
  "term": "Positive-tone development",
  "field": "Chemistry",
  "definition": "A lithographic process in which the areas of a photoresist exposed to radiation become soluble in the developer solution, while unexposed areas remain insoluble. This results in a pattern where the exposed regions are removed, leaving behind a positive image of the mask. The solubility change is often achieved through a chemical reaction, such as chain scission or deprotection, induced by the radiation.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1884 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/positive-tone-development/"
}