Photoresist

{
  "id": "MLC-T-CHM-013402",
  "term": "Photoresist",
  "field": "Chemistry",
  "definition": "A light-sensitive polymeric material used in photolithography to transfer a pattern from a photomask onto a substrate. Upon exposure to ultraviolet light, its solubility in a developer solution changes, allowing for selective removal of either the exposed or unexposed regions. This material is widely used in the fabrication of microelectronic devices.",
  "subject": "Organic and Biomolecular Chemistry",
  "see_also": [
    "imaging",
    "solubility",
    "thin film"
  ],
  "references": [
    "PAC, 1996, 68, 2223. 'Glossary of terms used in photochemistry (IUPAC Recommendations 1996)' on page 2265 (https://doi.org/10.1351/pac199668122223)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/photoresist/"
}