Photolithography
Term · Chemistry · MLC-T-CHM-008887
A patterning process that uses light to transfer a geometric design from a photomask to a light-sensitive chemical photoresist on a substrate. The photoresist is selectively exposed to ultraviolet light, altering its solubility, and then developed to create a relief pattern. This technique is extensively used in the fabrication of microelectronic devices, such as integrated circuits, and in the production of microelectromechanical systems.
| Identifier | MLC-T-CHM-008887 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| Synonyms | optical lithography |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Lithography; Image; Mask; Resist |
Record as JSON
{
"id": "MLC-T-CHM-008887",
"term": "Photolithography",
"field": "Chemistry",
"definition": "A patterning process that uses light to transfer a geometric design from a photomask to a light-sensitive chemical photoresist on a substrate. The photoresist is selectively exposed to ultraviolet light, altering its solubility, and then developed to create a relief pattern. This technique is extensively used in the fabrication of microelectronic devices, such as integrated circuits, and in the production of microelectromechanical systems.",
"synonyms": [
"optical lithography"
],
"subject": "Polymer",
"see_also": [
"lithography",
"image",
"mask",
"resist"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/photolithography/"
}
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