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Photolithography

Term · Chemistry · MLC-T-CHM-008887

A patterning process that uses light to transfer a geometric design from a photomask to a light-sensitive chemical photoresist on a substrate. The photoresist is selectively exposed to ultraviolet light, altering its solubility, and then developed to create a relief pattern. This technique is extensively used in the fabrication of microelectronic devices, such as integrated circuits, and in the production of microelectromechanical systems.

Table 1. Record
IdentifierMLC-T-CHM-008887
FieldChemistry
SubjectPolymer
Synonymsoptical lithography
ReferencesPAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215)
See alsoLithography; Image; Mask; Resist
Record as JSON
{
  "id": "MLC-T-CHM-008887",
  "term": "Photolithography",
  "field": "Chemistry",
  "definition": "A patterning process that uses light to transfer a geometric design from a photomask to a light-sensitive chemical photoresist on a substrate. The photoresist is selectively exposed to ultraviolet light, altering its solubility, and then developed to create a relief pattern. This technique is extensively used in the fabrication of microelectronic devices, such as integrated circuits, and in the production of microelectromechanical systems.",
  "synonyms": [
    "optical lithography"
  ],
  "subject": "Polymer",
  "see_also": [
    "lithography",
    "image",
    "mask",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/photolithography/"
}

Record 9,438 of 13,678 in Chemistry terminology (MLC-0109). Request the full dataset.