X-ray lithography
Term · Chemistry · MLC-T-CHM-012764
A lithographic technique that uses X-rays to transfer a pattern from a mask to a radiation-sensitive polymer film, known as a resist. The short wavelength of X-rays allows for the creation of very fine features, enabling high-resolution patterning. This method is used in the fabrication of microelectronic devices and MEMS.
| Identifier | MLC-T-CHM-012764 |
|---|---|
| Field | Chemistry |
| Subject | Polymer |
| References | PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215) |
| See also | Lithography; Image; Mask; Resist |
Record as JSON
{
"id": "MLC-T-CHM-012764",
"term": "X-ray lithography",
"field": "Chemistry",
"definition": "A lithographic technique that uses X-rays to transfer a pattern from a mask to a radiation-sensitive polymer film, known as a resist. The short wavelength of X-rays allows for the creation of very fine features, enabling high-resolution patterning. This method is used in the fabrication of microelectronic devices and MEMS.",
"subject": "Polymer",
"see_also": [
"lithography",
"image",
"mask",
"resist"
],
"references": [
"PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1878 (https://doi.org/10.1515/pac-2018-1215)"
],
"url": "https://mlchart.com/terminology/chemistry/x-ray-lithography/"
}
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