Ion beam resist

{
  "id": "MLC-T-CHM-006073",
  "term": "Ion beam resist",
  "field": "Chemistry",
  "definition": "A polymeric material designed to undergo a chemical or physical change upon exposure to an ion beam, enabling the creation of patterns in lithographic processes. The exposed regions become either more soluble (positive resist) or less soluble (negative resist) in a developer solution. These resists are used in high-resolution patterning for microfabrication.",
  "synonyms": [
    "ion-beam resist"
  ],
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/ion-beam-resist/"
}