Resist profile

{
  "id": "MLC-T-CHM-010232",
  "term": "Resist profile",
  "field": "Chemistry",
  "definition": "The cross-sectional shape of a resist feature after the development step in a lithographic process. This shape is determined by factors including the resist chemistry, exposure dose, and development conditions. An ideal profile for many applications is a rectangular cross-section with vertical sidewalls, but other shapes like undercut or sloped profiles are sometimes intentionally created for specific fabrication purposes, such as lift-off processes.",
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1887 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/resist-profile/"
}