Clearance dose

{
  "id": "MLC-T-CHM-002112",
  "term": "Clearance dose",
  "field": "Chemistry",
  "definition": "The minimum radiation dose required to completely remove a resist film from a substrate during the development process. This dose is a measure of the resist's sensitivity and its ability to be fully cleared in exposed areas. It is a key parameter in lithography for determining optimal exposure conditions.",
  "synonyms": [
    "clearing dose",
    "dose to clear"
  ],
  "subject": "Polymer",
  "see_also": [
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1869 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/clearance-dose/"
}