Resist polymer

{
  "id": "MLC-T-CHM-010231",
  "term": "Resist polymer",
  "field": "Chemistry",
  "definition": "A macromolecule specifically designed for use in resist formulations, where its chemical structure dictates its response to radiation and subsequent solubility in a developer. These polymers are the primary component responsible for the imaging properties of a resist material. Common examples include poly(methyl methacrylate) for electron beam lithography and novolac resins for photolithography.",
  "subject": "Polymer",
  "see_also": [
    "macromolecule",
    "irradiation",
    "photoresist",
    "solubility",
    "ultraviolet",
    "visible"
  ],
  "references": [
    "PAC, 2004, 76, 889. 'Definitions of terms relating to reactions of polymers and to functional polymeric materials (IUPAC Recommendations 2003)' on page 903 (https://doi.org/10.1351/pac200476040889)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/resist-polymer/"
}