Top-surface imaging

{
  "id": "MLC-T-CHM-012119",
  "term": "Top-surface imaging",
  "field": "Chemistry",
  "definition": "A lithographic technique where the image is formed only on the uppermost layer of a resist film, rather than throughout its entire thickness. This process typically involves a silylation step, where silicon-containing compounds are incorporated into the exposed or unexposed regions of the resist. Subsequent dry etching then transfers the pattern into the underlying resist or substrate.",
  "subject": "Polymer",
  "see_also": [
    "etch",
    "image",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1889 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/top-surface-imaging/"
}