Developed image

{
  "id": "MLC-T-CHM-003096",
  "term": "Developed image",
  "field": "Chemistry",
  "definition": "The patterned structure formed in a photoresist layer after exposure to radiation and subsequent chemical development. This image corresponds to the areas of the resist that were either removed or retained, depending on whether a positive or negative resist was used. It serves as a mask for subsequent etching or deposition steps in microfabrication.",
  "subject": "Polymer",
  "see_also": [
    "development",
    "image"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1875 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/developed-image/"
}