Resist strip

{
  "id": "MLC-T-CHM-010233",
  "term": "Resist strip",
  "field": "Chemistry",
  "definition": "The process of completely removing a patterned resist layer from a substrate after it has served its purpose as a mask for etching or ion implantation. This removal is accomplished using either a liquid chemical stripper, which dissolves or lifts off the polymer, or a plasma ashing process that uses a reactive gas to oxidize the resist into volatile compounds. The chosen method must effectively remove all resist residue without damaging the underlying substrate or fabricated structures.",
  "subject": "Polymer",
  "see_also": [
    "development",
    "etch",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1887 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/resist-strip/"
}