Reactive ion etching

{
  "id": "MLC-T-CHM-009979",
  "term": "Reactive ion etching",
  "field": "Chemistry",
  "definition": "A dry etching technique used in microfabrication that combines chemical reactions with physical sputtering to remove material from a substrate. Ions from a plasma are accelerated towards the substrate, enhancing the etch rate and providing anisotropic etching profiles. This method is widely used for patterning polymer films in semiconductor device manufacturing.",
  "subject": "Polymer",
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1886 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/reactive-ion-etching/"
}