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Photoelectrochemical etching

Term · Chemistry · MLC-T-CHM-008856

A process where a semiconductor material is selectively dissolved or removed from a surface through a combination of light irradiation and electrochemical reactions. Light absorption generates electron-hole pairs in the semiconductor, which then participate in redox reactions at the semiconductor-electrolyte interface. This technique is used in microfabrication and surface patterning.

Table 1. Record
IdentifierMLC-T-CHM-008856
FieldChemistry
SubjectOrganic and Biomolecular Chemistry
ReferencesPAC, 1996, 68, 2223. 'Glossary of terms used in photochemistry (IUPAC Recommendations 1996)' on page 2260 (https://doi.org/10.1351/pac199668122223)
See alsoDissolution; Semiconductor
Record as JSON
{
  "id": "MLC-T-CHM-008856",
  "term": "Photoelectrochemical etching",
  "field": "Chemistry",
  "definition": "A process where a semiconductor material is selectively dissolved or removed from a surface through a combination of light irradiation and electrochemical reactions. Light absorption generates electron-hole pairs in the semiconductor, which then participate in redox reactions at the semiconductor-electrolyte interface. This technique is used in microfabrication and surface patterning.",
  "subject": "Organic and Biomolecular Chemistry",
  "see_also": [
    "dissolution",
    "semiconductor"
  ],
  "references": [
    "PAC, 1996, 68, 2223. 'Glossary of terms used in photochemistry (IUPAC Recommendations 1996)' on page 2260 (https://doi.org/10.1351/pac199668122223)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/photoelectrochemical-etching/"
}

Record 9,405 of 13,676 in Chemistry terminology (MLC-0109). Request the full dataset.