Photoelectrochemical etching
Term · Chemistry · MLC-T-CHM-008856
A process where a semiconductor material is selectively dissolved or removed from a surface through a combination of light irradiation and electrochemical reactions. Light absorption generates electron-hole pairs in the semiconductor, which then participate in redox reactions at the semiconductor-electrolyte interface. This technique is used in microfabrication and surface patterning.
| Identifier | MLC-T-CHM-008856 |
|---|---|
| Field | Chemistry |
| Subject | Organic and Biomolecular Chemistry |
| References | PAC, 1996, 68, 2223. 'Glossary of terms used in photochemistry (IUPAC Recommendations 1996)' on page 2260 (https://doi.org/10.1351/pac199668122223) |
| See also | Dissolution; Semiconductor |
Record as JSON
{
"id": "MLC-T-CHM-008856",
"term": "Photoelectrochemical etching",
"field": "Chemistry",
"definition": "A process where a semiconductor material is selectively dissolved or removed from a surface through a combination of light irradiation and electrochemical reactions. Light absorption generates electron-hole pairs in the semiconductor, which then participate in redox reactions at the semiconductor-electrolyte interface. This technique is used in microfabrication and surface patterning.",
"subject": "Organic and Biomolecular Chemistry",
"see_also": [
"dissolution",
"semiconductor"
],
"references": [
"PAC, 1996, 68, 2223. 'Glossary of terms used in photochemistry (IUPAC Recommendations 1996)' on page 2260 (https://doi.org/10.1351/pac199668122223)"
],
"url": "https://mlchart.com/terminology/chemistry/photoelectrochemical-etching/"
}
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