Dry development

{
  "id": "MLC-T-CHM-003459",
  "term": "Dry development",
  "field": "Chemistry",
  "definition": "A lithographic process where the exposed resist material is selectively removed using a dry etching technique, such as plasma etching, rather than a liquid solvent. This method avoids the use of wet chemicals and can offer advantages in terms of environmental impact and pattern resolution. It is often used for advanced resist systems in semiconductor manufacturing.",
  "subject": "Polymer",
  "see_also": [
    "image",
    "resist"
  ],
  "references": [
    "PAC, 2020, 92, 1861. 'Terminology of polymers in advanced lithography (IUPAC Recommendations 2020)' on page 1873 (https://doi.org/10.1515/pac-2018-1215)"
  ],
  "url": "https://mlchart.com/terminology/chemistry/dry-development/"
}